Review of Cathodic Arc Deposition for Preparing Droplet-Free Thin Films

Takikawa, Hirofumi

doi:10.1109/deiv.2006.357354

Cited by 5 publications

(3 citation statements)

References 53 publications

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“…To handle and confine the electric charge, particle dissipation and current density of induced charge are used magnetic coils attached to the reactor walls. The advantages associated with employing the AC plasma reactor for deposition aim are recognized to be the potential for smaller installations, a wide choice of reactants, appropriate chemical reactivity and current consumed (Takikawa and Tanoue 2007).…”

Section: Resultsmentioning

confidence: 99%

Selection of the best plasma reactor for the diamond chemical vapor deposition operation of waste materials using multi-criteria decision-making models

Hassanpour

2021

Preprint

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Wastes emerged as potential alternative energy to flourish in various useful materials and commodities for human demands. In the civilized nation's variety of industrial projects of plasma, reactors underwent the decision-making models, project approval and even exploitation stages from long ago. The current study comprised waste materials utilization in diamond deposition purposes via chemical vapor deposition for constructing future industries firstly. To select the best plasma reactor were employed seven multi-criteria decision-making models in combination with three kinds of weighing systems to select the best plasma reactor empirically. Initial data for assessment possessed from a deep literature review based on probative technologies. It was classified and prioritized the plasma reactors in a coherent connection for direct gasification operation and placed them in a relevant arrangement media for partial gasification assortment. The developed assortment of plasma reactors was generally indicated as alternating current, direct current, glow, microwave, high-Frequency plasma, laser, Plasmatron and flame at direct gasification operation respectively. The high degree of stability among multi-criteria decision-making models and the sensitivity analysis employed for the weights and ranks released for alternatives and criteria had confirmed the precision and validity required. Also, on the global level, the findings of the present study proved the implementation of direct current plasma gasification reactors in large scale industries.

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Section: Resultsmentioning

confidence: 99%

Selection of the best plasma reactor for the diamond chemical vapor deposition operation of waste materials using multi-criteria decision-making models

Hassanpour

2021

Preprint

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“…In this case, the main task is to coordinate the density of ion currents on the sample and clean the plasma flow from aluminum droplets. To this end, an attenuator was used to weaken the flow of titanium plasma, and a separator [12] was used for the purification of aluminum plasma. As a result, the ion current density per sample did not exceed 20 mA/cm 2 .…”

Section: Mittels Vakuum-lichtbogenplasmaquelle Abgeschiedene Ein-und mentioning

confidence: 99%

Single‐layer and multi‐layer wear‐resistant coatings

Kostrin

2019

Vak Forsch Prax

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Summary In this paper the formation of wear‐resistant coatings based on titanium and aluminum compounds using vacuum arc discharge and molecular nitrogen as a working gas is discussed. The experiments were carried out using an installation containing two independent evaporators and a system for attenuation and purification of the plasma flow. To obtain a high‐quality coating, it is necessary to ensure the equality of the ion flux densities coming to the substrate. The results of the experiments show that by changing the bias voltage on the substrate it is possible to adjust the content of elements in the coating and thus to control its parameters. Multi‐layer coatings have better performance characteristics, but require an improved degree of purification of the plasma flow from the droplet fraction.

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“…In the CVAD method, a solid material is used as cathode, which acts as an evaporation source. The cathode material evaporates at a cathode spot, which is very active and has high temperatures when formed by an arc discharge [19]. Because the amount of ion in the plasma is large and ion energy is high, the CVAD method makes it possible to deposit films having a different film quality from that produced through the conventional sputtering method.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Tungsten Carbide Films by Filtered Pulse Arc Deposition with Cemented Tungsten Carbide Cathodes

Isono¹,

Tanimoto²,

Iijima³

et al. 2017

MSA

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Tungsten carbide films (W-C films) were fabricated on silicon substrates by using the filtered pulse arc deposition (FPAD) method. Two types of cemented tungsten carbide (WC) were used as cathode, one containing Co and the other Ti, which were used as binders for forming the cathode shape. The films were fabricated by varying the pulse arc current and substrate bias voltage. The discharge, deposition and film properties were investigated under these deposition conditions. The cathode wear amount when using WC-Co (WC cathode containing Co) was found to be smaller than that measured when WC-Ti (WC cathode containing Ti) was used. The W-C film thickness was approximately 30-40 nm under all conditions, except when the pulse arc current was 50 A and the film thickness, was approximately 10 nm. Compared to the WC-Ti, the consumption of cathode material is suppressed in the WC-Co, indicating that the efficiency for film preparation of the latter is good. From the X-ray diffraction analysis, the crystalline phase of W-C films fabricated using WC-Co and WC-Ti were observed as W 2 C and WC 1−x , respectively, indicating that different crystalline phases could be fabricated using different cathodes. From the X-ray photoelectron spectroscopy analysis, the oxidation layer formed by air exposure was observed to exclusively exist on the W-C film surface. Moreover, almost all oxygen in the oxidation layer bonded with tungsten.

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Review of Cathodic Arc Deposition for Preparing Droplet-Free Thin Films

Cited by 5 publications

References 53 publications

Selection of the best plasma reactor for the diamond chemical vapor deposition operation of waste materials using multi-criteria decision-making models

Selection of the best plasma reactor for the diamond chemical vapor deposition operation of waste materials using multi-criteria decision-making models

Single‐layer and multi‐layer wear‐resistant coatings

Fabrication of Tungsten Carbide Films by Filtered Pulse Arc Deposition with Cemented Tungsten Carbide Cathodes

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