Development of Photosensitive Vinyl Polymers with Imide Group Based on Reaction Development Patterning

Development of Photosensitive Alicyclic Polyimides Based on Reaction Development Patterning

“…/ organic solvent developer [6,10,11]. From these results and the previous studies [5][6][7][8][9][10][11], the pattern-forming mechanism of RDP of alicyclic polyimides by TMAHaq. is considered as shown in Fig.…”

“…In addition, high temperature post-curing is necessary for imide ring formation, and it causes shrink of patterns. On the other hand, we have developed a novel pattern-forming method, reaction development patterning (RDP), for polymers which have carboxylic acid derivatives (-C(O)-X-) like polyimides, polycarbonates, polyesters and vinyl polymers [5][6][7][8]. Pattern formation in RDP is based on nucleophilic acyl substitution reaction of nucleophiles, such as OH -, in developer with carboxylic acid derivatives such as imide group (Scheme 1).…”

Photosensitive poly(vinylene carbonate)s based on reaction development patterning with dilute aqueous alkaline solution

“…On the basis of the results obtained from these experiments, we have proposed the most probable mechanism of RDP in which the key reactions for pattern formation are nucleophilic acyl substitutions shown in Schemes S1 and S2. Judging from the reaction in a beaker (previous section), the results of pattern formation and our previous studies described above, positive‐tone patterns of the P(VCA–VAc) copolymers are considered to be formed by side‐chain‐type RDP shown in Fig. .…”

“…However, applying RDP to polymers having carboxylic acid derivatives on their side chains is difficult because the steric hindrance of the adjacent side chains inhibits the reaction between the nucleophile in the developer and the carboxylic acid derivatives. The only examples of successful side‐chain‐type RDP are pattern formations using copolymers containing maleimide units (Scheme S2) . These pattern formations are accomplished, probably, because the cyclic structure of the maleimide minimizes the steric hindrance of the side chains.…”

Addition of Photosensitivity to Hyperbranched Engineering Plastics based on Reaction Development Patterning

“…To resolve these problems, we have developed a novel pattern-forming process, Reaction Development Patterning (RDP), for unfunctionalized polyimides, polycarbonates (PCs), polyesters and vinyl polymers [7][8][9][10][11][12][13][14][15][16][17][18]. In RDP, a photosensitive agent (diazonaphthoquinone, DNQ) in the system plays a role in differentiating permeability of a developer into the exposed area from that into the unexposed area.…”