Photosensitive poly(vinylene carbonate)s based on reaction development patterning with dilute aqueous alkaline solution

Abstract

Pattern formation of copolymers containing vinylene carbonate units was achieved by reaction development patterning, in which permeation of the developer and hydrolysis of the carbonates were selectively induced at irradiated areas.

Organic–inorganic polyimide nanocomposites containing a tetrafunctional polyhedral oligomeric silsesquioxane amine: synthesis, morphology and thermomechanical properties

“…[16][17][18][19][20] In the past few years, various POSS macromers have also been introduced into polyimides. [21][22][23][24][25][26][27][28][29][30][31][32][33][34][35][36] Tamaki et al 37 and Huang et al 38 first reported the preparation of POSS-containing hybrid polyimides by the use of an octafunctional POSS amine. Notably, the glass transition temperatures of the materials were dramatically enhanced whereas the coefficient of thermal expansion decreased.…”

Photosensitive Polyimide-silicone Copolymer based on Reaction Development Patterning (RDP)

“…We have developed a different type of patternforming method, reaction development patterning (RDP) [6][7][8][9][10][11][12][13][14][15][16][17][18][19][20]. Pattern formation by RDP uses nucleophilic acyl substitution reaction between nucleophiles such as OH − in developer and carbox-ylic acid derivatives like imide and ester groups in polymer (Scheme 1).…”