Development of Photosensitive Alicyclic Polyimides Based on Reaction Development Patterning

2018

Self Cite

Reaction development patterning (RDP) applicable to polyacetals was investigated by using inverse acid-base condition, namely, photo-base generator and acidic developers. Polyacetal films composed of polyacetals, O-phenylacetyl 2-acetonaphthone oxime as a photo-base generator and benzophenone as a photosensitizer gave positive-tone patterns after irradiation with an ultrahigh-pressure mercury lamp and successive dipping in developer containing carboxylic acid, methanesulfonic acid or sulfuric acid. Reduction in thickness at the unexposed area was inhibited by incorporation of trifluoromethyl groups to polyacetals.

Section: Introductionmentioning

confidence: 99%

Formation of Fine Pattern by Reaction Development Patterning Using Photo-Base Generator and Acidic Developers

Tokoro

Hayashi

2018

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“…We have developed a different type of patternforming method, reaction development patterning (RDP) [6][7][8][9][10][11][12][13][14][15][16][17][18][19][20]. Pattern formation by RDP uses nucleophilic acyl substitution reaction between nucleophiles such as OH − in developer and carbox-ylic acid derivatives like imide and ester groups in polymer (Scheme 1).…”

Section: Introductionmentioning

confidence: 99%

Photosensitive Polyimide-silicone Copolymer based on Reaction Development Patterning (RDP)

Kasahara

Yasuda

et al. 2016

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Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photo-irradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film.

“…Hence, the photo-irradiated areas selectively dissolve in the developer containing nucleophiles, affording patterned engineering plastics. Nowadays, RDP can be applied to PIs [5][6][7], PArs [8][9][10] and polycarbonates [11].…”

Section: Introductionmentioning

confidence: 99%

“…To leave out the additional functionalization and the use of precursors for photosensitivity, we have developed reaction development patterning (RDP) method [5][6][7]. RDP is based on nucleophilic acyl substitution (NAS) between carboxylic-acidderivative (-C(O)-X-) bonds in main-chains of engineering plastics and nucleophiles in developer (Fig.…”

Section: Introductionmentioning

confidence: 99%

Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning

Tokoro

Miyoshi

2017

Self Cite

Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photoirradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film.