Formation of Fine Pattern from Polyarylate-Silicone Copolymer by the Application of Reaction Development Patterning

Abstract

Multi-block copolymers between polyester (polyarylate) and polydimethylsiloxane were prepared by polycondensation using polydimethylsiloxane having p-hydroxyphenyl groups at its both chain ends as a diol monomer. The copolymer gave positive-tone fine pattern by the reaction development patterning with developer containing ethanolamine as a nucleophile. The silicone unit hybridized with polyarylate enabled pattern formation from dry film by contributing not only to high photosensitivity but also to high dissolution rate at the photoirradiated area. Use of polyarylate instead of the copolymer resulted in unsuccessful pattern formation from dry film.

Formation of Fine Pattern by Reaction Development Patterning Using Photo-Base Generator and Acidic Developers

“…In order to give photosensitivity to readily accessible engineering plastics, we have developed reaction development patterning (RDP) [7][8][9][10][11][12][13][14][15][16][17] based on nucleophilic acyl substitution between carboxylic-acid-derivative (-C(O)-X-) bonds in polymer main-chains and nucleophiles in developer. RDP uses polymer films prepared from varnish containing engineering plastics and photo-acid generators such as diazonaphthoquinone.…”