2016
DOI: 10.2494/photopolymer.29.277
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Development of Novel Low-temperature Curable Positive-Tone Photosensitive Polyimide with High Elongation

Abstract: Recently, progress of semiconductor packaging is drastic and multi-pinned devices such as Fan-out Wafer Level Packages (FOWLPs) attract much attention. For those applications, photosensitive polyimides (PSPIs) are applied as redistribution layers (RDLs) and they are required to have high level of properties such as adhesion to metal and reliability. We developed novel low-temperature curable positive-tone photosensitive polyimides (posi-PSPIs) with high elongation, strong adhesion to the copper RDLs, and high … Show more

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Cited by 8 publications
(7 citation statements)
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“…In addition, the polyimide shows good adhesion properties to Cu [4]. We examined the adhesion between copper and the polyimide by a previous report [4]. In the previous work, we found that oxygen permeation in the polyimide film proceeds the Cu oxidation to decrease the adhesion strength.…”
Section: Polyimide Formationmentioning
confidence: 91%
See 1 more Smart Citation
“…In addition, the polyimide shows good adhesion properties to Cu [4]. We examined the adhesion between copper and the polyimide by a previous report [4]. In the previous work, we found that oxygen permeation in the polyimide film proceeds the Cu oxidation to decrease the adhesion strength.…”
Section: Polyimide Formationmentioning
confidence: 91%
“…The LT-S8001 is low temperature curable photosensitive polyimide having 3-m resolution at 7-m thickness. In addition, the polyimide shows good adhesion properties to Cu [4]. We examined the adhesion between copper and the polyimide by a previous report [4].…”
Section: Polyimide Formationmentioning
confidence: 98%
“…Various studies have been conducted for low temperature curing. In order to perform imide ring closure at a low temperature, a thermobase generator is added [49], and an pre-imidized polymer is used [47]. In addition, focusing on the main chain structure of polyimide, Sasaki reported that the imidization rate determined by the acidity of the diamine component.…”
Section: Low Temperature Curable Photosensitive Polyimidementioning
confidence: 99%
“…In the case of photosensitive dielectrics for fan-out wafer level packaging (FO-WLP), which is focused mainly on form factor and heterogeneous integration, low temperature curable materials below 200 º C are required to reduce warpage of the re-constituted wafer and minimize thermal damage on the embedded ICs [11][12][13][14][15][16]. In addition, higher resolution especially for via openings is also needed to meet future design rules for FO-WLP.…”
Section: Introductionmentioning
confidence: 99%