Development of Multilayer Laue Lenses; (1) Linear Type

Koyama, Takahisa; Takenaka, Hisataka; Ichimaru, Setsuo; Ohchi, Tadayuki; Tsuji, Takuya; Takano, Hidekazu; Kagoshima, Yasushi

doi:10.1063/1.3625296

Cited by 22 publications

(6 citation statements)

References 12 publications

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“…9.11, in general, the multilayer Laue lenses can be grouped into four categories according to the fulfillment of the Bragg condition: the flat, tilted, wedged and curved lenses. The variation of the focus profile as a function of the tilting angle shows that the performance is optimized at a specific angle [65]. In normal incidence (namely, when the tilting angle is zero), only in the center the diffraction intensity is appreciable because the Bragg condition is not satisfied in the outer region.…”

Section: Multilayer Laue Lensesmentioning

confidence: 99%

Micro- and Nano-X-ray Beams

Martı́nez-Criado

Mino

2013

Characterization of Semiconductor Heterostructures and Nanostructures

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Section: Multilayer Laue Lensesmentioning

confidence: 99%

Micro- and Nano-X-ray Beams

Martı́nez-Criado

Mino

2013

Characterization of Semiconductor Heterostructures and Nanostructures

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“…One desires not only a lens that focuses efficiently, but also one that provides a reasonably large working distance. MLLs can achieve nanofocusing because the outer most layer thickness of the linear zone plate structure, which determines the spatial resolution, is limited only by the technology of thin film sputtering [1][2][3][4][5][6][7][8], and a sputtered layer thickness less than 0.7 nm has been demonstrated [9]. Furthermore, focusing efficiencies can be dramatically increased by satisfying a Bragg condition [10].…”

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confidence: 99%

Efficiency of a multilayer-Laue-lens with a 102 μm aperture

Macrander

Kubec

Conley

et al. 2015

Applied Physics Letters

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A multilayer-Laue-lens (MLL) comprised of WSi2/Al layers stacked to a full thickness of 102 μm was characterized for its diffraction efficiency and dynamical diffraction properties by x-ray measurements made in the far field. The achieved aperture roughly doubles the previous maximum reported aperture for an MLL, thereby doubling the working distance. Negative and positive first orders were found to have 14.2% and 13.0% efficiencies, respectively. A section thickness of 9.6μm was determined from Laue-case thickness fringes in the diffraction data. A background gas consisting of 90% Ar and 10% N2 was used for sputtering. This material system was chosen to reduce grown-in stress as the multilayer is deposited. Although some regions of the full MLL exhibited defects, the presently reported results were obtained for a region devoid of defects. The data compare well to dynamical diffraction calculations with Coupled Wave Theory (CWT) which provided confirmation of the optical constants and densities assumed for the CWT calculations

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“…Despite the success of FZPs in soft X-ray (SXR) microscopy which was facilitated by developments in the conventional fabrication technique of e-beam lithography (EBL), the development of FZPs for HXR remained challenging due to the need for very high aspect ratios which are usually out of limits of EBL (A r of up to about 25 is achievable with increasingly complex techniques) [14,15]. Recently, there have been improvements in focusing of HXR via various diffractive optics such as, multilayer Laue lenses, lithographic and multilayer FZPs achieving high resolutions and efficiencies [1,[16][17][18][19][20][21][22][23]. FZPs based on multilayer fabrication techniques (ML-FZPs) where a fiber core is coated with a multilayer and sliced to deliver the ML-FZP, overcome the problem of achieving a high aspect ratio by the nature of the fabrication method [19,[24][25][26][27][28][29][30][31][32].…”

Section: Introductionmentioning

confidence: 99%

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

Keskinbora¹,

Robisch²,

Mayer³

et al. 2014

Opt. Express

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X-ray microscopy is a successful technique with applications in several key fields. Fresnel zone plates (FZPs) have been the optical elements driving its success, especially in the soft X-ray range. However, focusing of hard X-rays via FZPs remains a challenge. It is demonstrated here, that two multilayer type FZPs, delivered from the same multilayer deposit, focus both hard and soft X-rays with high fidelity. The results prove that these lenses can achieve at least 21 nm half-pitch resolution at 1.2 keV demonstrated by direct imaging, and sub-30 nm FWHM (fullpitch) resolution at 7.9 keV, deduced from autocorrelation analysis. Reported FZPs had more than 10% diffraction efficiency near 1.5 keV. ©2014 Optical Society of AmericaOCIS codes: (340.7460) X-ray microscopy; (340.0340) X-ray optics; (340.6720) Synchrotron radiation; (340.7480) X-rays, soft x-rays, extreme ultraviolet (EUV); (050.1965) Diffractive lenses; (220.4241) Nanostructure fabrication. References and links1. J. Vila-Comamala, Y. Pan, J. J. Lombardo, W. M. Harris, W. K. S. Chiu, C. David, and Y. Wang, "Zonedoubled Fresnel zone plates for high-resolution hard X-ray full-field transmission microscopy," J. Synchrotron Radiat. 19(5), 705-709 (2012). 2. E. Zschech, C. Wyon, C. E. Murray, and G. Schneider, "Devices, materials, and processes for nanoelectronics: characterization with advanced x-ray techniques using lab-based and synchrotron radiation sources," Adv. Eng. Mater. 13(8), 811-836 (2011 Schütz, "Fast spin-wave-mediated magnetic vortex core reversal," Phys. Rev. B 86(13), 134426 (2012). 5. J. Kirz and C. Jacobsen, "The history and future of X-ray microscopy," J. Phys. Conf. Ser. 186, 012001 (2009). 6. P. Kirkpatrick and A. V. Baez, "Formation of optical images by X-Rays," J. Opt. Soc. Am. 38(9), 766-774 (1948 International Journal of Optics 31(4), 403-413 (1984). 46. A. A. Michelson, Studies in Optics (Dover Publications, Incorporated, 1995. 47. G. R. Morrison, "Phase contrast and darkfield imaging in x-ray microscopy," Proc. SPIE 1741, 186-193 (1993).

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Development of Multilayer Laue Lenses; (1) Linear Type

Cited by 22 publications

References 12 publications

Micro- and Nano-X-ray Beams

Micro- and Nano-X-ray Beams

Efficiency of a multilayer-Laue-lens with a 102 μm aperture

Multilayer Fresnel zone plates for high energy radiation resolve 21 nm features at 12 keV

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