Development of low-pressure high-frequency plasma chemical vapor deposition method on surface modification of silicon wafer

Thungsuk, Nuttee; Nuchuay, P.; Hirotani, Daisuke; Okamura, Yoshimi; Nakabayashi, Kenichi; Kinoshita, Hiroyuki; Yuji, Toshifumi; Mungkung, Narong; Kasayapanand, Nat

doi:10.1016/j.vacuum.2014.06.029

Cited by 2 publications

(2 citation statements)

References 24 publications

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“…The hydrophilicity of the PEN surface for 15 d after the treatment was evaluated using the θ=2 method by dropping 1.0 µL droplets of pure water onto the surface and measuring the contact angle using a contact angle meter (Kyowa Interface Science type CA-D). 18) XPS (Shimadzu=KRATOS AXIS-HS) measurements were repeated five times using a Mg Kα (1253.6 eV) X-ray source 1, 2, 8, and 14 d after the treatment was applied to analyze C 1s and O 1s elements.…”

Section: Experimental Methodsmentioning

confidence: 99%

Surface chemical structure of poly(ethylene naphthalate) films during degradation in low-pressure high-frequency plasma treatments

Kamata

Yuji

Thungsuk

et al. 2018

Jpn. J. Appl. Phys.

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The surface chemical structure of poly(ethylene naphthalate) (PEN) films treated with a low-pressure, high-frequency plasma was investigated by storing in a box at room temperature to protect the PEN film surface from dust. The functional groups on the PEN film surface changed over time. The functional groups of -C=O, -COH, and -COOH were abundant in the Ar + O 2 mixture gas plasma-treated PEN samples as compared with those in untreated PEN samples. The changes occurred rapidly after 2 d following the plasma treatment, reaching steady states 8 d after the treatment. Hydrophobicity had an inverse relationship with the concentration of these functional groups on the surface. Thus, the effect of the lowpressure high-frequency plasma treatment on PEN varies as a function of storage time. This means that radical oxygen and oxygen molecules are clearly generated in the plasma, and this is one index to confirm that radical reaction has definitely occurred between the gas and the PEN film surface with a low-pressure high-frequency plasma.

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Section: Experimental Methodsmentioning

confidence: 99%

Surface chemical structure of poly(ethylene naphthalate) films during degradation in low-pressure high-frequency plasma treatments

Kamata

Yuji

Thungsuk

et al. 2018

Jpn. J. Appl. Phys.

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“…Consequently, substrate can be high adhesion between plastic surface and metal film. In addition, plasma chemical vapor deposition (CVD) has good characteristics in terms of uniform film formation, and most of all, is nonthermal plasma deposition (11)(12). Thus, this plasma system is suitable for polymer materials.…”

Section: Introductionmentioning

confidence: 99%

The Development of Polyethylene Naphthalate Films by Low-pressure High-frequency Plasma Chemical Vapor Deposition System with Advance Oxidations Process

Thungsuk

Yuji

Mungkung

et al. 2015

Journal of Advanced Oxidation Technologies

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Abstract:The low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with nonthermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O 2 gas was used in the plasma treatment. The oxygen gas flow rate was between 0.1 L/min and 0.5 L/min, whereas the Ar gas flow rate was set at 10 L/min. The surface was investigated by contact angle meter and X-ray photoelectron spectroscopy (XPS) to determine the differences between untreated and treated surfaces. The results indicated that the low-pressure high-frequency plasma chemical vapor deposition system could be used for surface modification.

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Development of low-pressure high-frequency plasma chemical vapor deposition method on surface modification of silicon wafer

Cited by 2 publications

References 24 publications

Surface chemical structure of poly(ethylene naphthalate) films during degradation in low-pressure high-frequency plasma treatments

Surface chemical structure of poly(ethylene naphthalate) films during degradation in low-pressure high-frequency plasma treatments

The Development of Polyethylene Naphthalate Films by Low-pressure High-frequency Plasma Chemical Vapor Deposition System with Advance Oxidations Process

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