Development of internal-antenna-driven large-area RF plasma sources using multiple low-inductance antenna units

Large-area low-damage plasma sources driven by multiple low-inductance-antenna modules for next-generation flat-panel display processes

“…In order to provide straightforward and promising solutions to overcome the problems described above, a series of our works [17][18][19][20][21] have been carried out on the basis of the plasma-generation and profile-control technologies employing multiple low-inductance antenna (LIA) modules, whose antenna size is substantially shorter than the propagation wavelength, to sustain meter-scale inductivelycoupled plasmas, whose concepts are schematically shown in Fig. 1.…”

Nanocrystalline Si:H films made by inductively coupled plasma using internal low inductance antenna

“…For manufacturing solar panels using a plasma-enhanced chemical vapor deposition (PE-CVD) process, a higher plasma density and a larger yet uniform plasma zone are thus advantageous. Many methods have been proposed to generate such high-density plasmas [5][6][7], and recently, an inductively coupled plasma (ICP) system using arrays of internal low inductance antennas (LIA) has been proposed to produce large-area, highly crystallized ncSi:H films [8][9][10]. The LIA units can produce high-density plasma with low plasma potential (as low as 10 V, thus low plasma damage to the deposited film) by decreasing the electrostatic coupling within the plasma.…”

Study of Internal Linear Inductively Coupled Plasma Source for Ultra Large-Scale Flat Panel Display Processing

“…[4][5][6][7]. However, with the increase in processing area to sizes greater than one meter, the length of the antenna line becomes comparable to the wavelength of the RF power, which leads to a standing wave effect in addition to a large RF voltage.…”