2015 IEEE 65th Electronic Components and Technology Conference (ECTC) 2015
DOI: 10.1109/ectc.2015.7159636
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Development of high throughput adhesive bonding scheme by wafer-level underfill for 3D die-to-interposer stacking with 30µm-pitch micro interconnections

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Cited by 7 publications
(1 citation statement)
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“…The most well-known method of preparing microbumps is the soldering process [ 51 ]. In this process, microbumps can be obtained in sizes ranging from 10 μm to 30 μm [ 52–54 ]. In order to continuously scale down the microbumps size to 1 μm, the electroplating method is employed, which is subsequently followed by patterning the pillar-type structure of the microbumps [ 55 ].…”
Section: Three-dimensional Integrated Circuits: the Technologymentioning
confidence: 99%
“…The most well-known method of preparing microbumps is the soldering process [ 51 ]. In this process, microbumps can be obtained in sizes ranging from 10 μm to 30 μm [ 52–54 ]. In order to continuously scale down the microbumps size to 1 μm, the electroplating method is employed, which is subsequently followed by patterning the pillar-type structure of the microbumps [ 55 ].…”
Section: Three-dimensional Integrated Circuits: the Technologymentioning
confidence: 99%