2016 88th ARFTG Microwave Measurement Conference (ARFTG) 2016
DOI: 10.1109/arftg.2016.7839719
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Development of a reference wafer for on-wafer testing of extreme impedance devices

Abstract: Abstract-This paper describes the design, fabrication, and testing of an on-wafer substrate that has been developed specifically for measuring extreme impedance devices using an on-wafer probe station. Such devices include carbon nano-tubes (CNTs) and structures based on graphene which possess impedances in the kΩ range and are generally realised on the nano-scale rather than the micro-scale that is used for conventional onwafer measurement. These impedances are far removed from the conventional 50-Ω reference… Show more

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Cited by 5 publications
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“…This may be an indication of radiation losses and parasitic coupling with neighboring on-wafer structures that are closely spaced or direct coupling between the structures and the GSG probe [59,60]. Moreover, multiple reflections may occur before the signal reaching the end of the structure as a result of impedance mismatch between the probe tip and the on-wafer design [61][62][63]. Another cause can be due to material characteristics as well as fabrication imperfections on the InP substrate.…”
Section: Vna Measurements Of Utc-pdsmentioning
confidence: 99%
“…This may be an indication of radiation losses and parasitic coupling with neighboring on-wafer structures that are closely spaced or direct coupling between the structures and the GSG probe [59,60]. Moreover, multiple reflections may occur before the signal reaching the end of the structure as a result of impedance mismatch between the probe tip and the on-wafer design [61][62][63]. Another cause can be due to material characteristics as well as fabrication imperfections on the InP substrate.…”
Section: Vna Measurements Of Utc-pdsmentioning
confidence: 99%