Development of a novel plasma probe for the investigation and control of plasma‐enhanced chemical vapor deposition coating processes

Abstract

A plasma probe and measuring method were developed to simultaneously determine both the electron density, n e , and floating potential in plasmaenhanced chemical vapor deposition (PECVD) coating processes within lowpressure plasmas. The functionality of the probe with a high deposition rate is demonstrated on the basis of examples using hexamethyldisiloxane as a precursor gas. The results show that the developed probe can determine both the n e (∼10 15 m −3) and the time-varying floating potential. The results also indicate that the probe is effective for monitoring the changes in the plasma condition caused by the pressure and the gas flow rate during the coating process. This method can contribute to confirm the process and chamber conditions in PECVD processes.

Preparation of Ceramic Fiber Threads with Enhanced Abrasion Resistance Performance

“…For post-treatment modification, the preparation process of the abrasion-resistant coatings and the selection of the abrasion-resistant modifiers are crucial. Common preparation processes for coatings include the sol-gel method [26], plasma-enhanced chemical vapor deposition method [27], spray-coating method [28], and dip-coating method [29]. Given the simplicity and cost-effectiveness of the preparation process and the wide range of available dipping modifiers, the dip-coating method is expected to be an effective and suitable preparation process to enhance the surface abrasion resistance performance of ceramic fiber threads.…”

Numerical profile correction of microwave cavity resonance spectroscopy measurements of the electron density in low-pressure discharges

“…An important subset of the vastly different types of plasmas is constituted by low-temperature plasmas in which the electrons have energies up to several electronvolts, while the thermal energy of heavy particles (i.e., ions, radicals, and neutrals) remains near room temperature. This allows for lowtemperature chemistry that is widely applied in industrial processes, such as those used for the production of solar cells 1 and functional coatings, 2 the synthesis of (nano)materials, 3,4 and the plasma-based dissociation of CO 2 for fuel synthesis. 5,6 Since free electrons dictate most of the elementary processes in plasmas, measuring their properties is of paramount importance to enhance the understanding and development of such applications.…”

Detection of long‐lived species in plasma‐activated water, based on digital colorimetry

“…Therefore, researchers have been developing various detection methods for plasma diagnosis. [7][8][9][10][11][12] For example, using absorption spectroscopy, Bruggeman et al [8] measured the absolute hydroxyl radical density in diffuse atmosphericpressure He-H 2 O RF glow discharges. Additionally, using laser-induced fluorescence, Riès [10] measured the spatial distribution of hydroxyl radicals.…”