Thin liquid layers of polydimethylsiloxane (PDMS) were irradiated by VUV light under nitrogen atmosphere using a Xe(2)- excimer lamp. The irradiated layers were analyzed with infrared reflection absorption spectroscopy (IRRAS) and X-ray photoelectron spectroscopy (XPS), showing a gradual photochemical-induced conversion of the liquid PDMS to solid SiO(2)-like coatings. IRRAS measurements revealed a smooth frequency shift of the maximal absorption band from 1111 to 1231 cm(-1) with increasing irradiation energy density caused by a gradual shift from the asymmetric Si-O stretching vibration of PDMS to the longitudinal optical (LO) mode of SiO(2). The shift was found to be dependent on the applied irradiation energy density and the O/Si ratio in the film analyzed by XPS measurements. The atomic ratio of O/Si increases from 1:1 to about 2.5:1. At the same time, the atomic ratio of C/Si decreases from 2:1 down to 1:6.5. Images taken by high resolution field emission scanning electron microscopy (FESEM) and scanning force microscopy (SFM) show a smooth surface without cracks or pores. The controllable coating properties in combination with the possibility for local irradiation using masks are promising high potential for the coating technology.
The local gas-flow behavior is almost unknown for low pressure plasma systems, except parallel plate reactors for semiconductor purposes. To overcome this lack of knowledge, this study starts with the influence investigation of the gas feed-in systems technical layout on the homogeneity of the gas supply for large volume plasma enhanced chemical vapor deposition (PECVD) chambers. Computational fluid dynamics (CFD) simulations are used as a tool to determine velocity and pressure distribution inside the gas feed-in pipe as well as in the PECVD-chamber itself. The parameters varied were: flow rate, pipe length, number of holes, hole diameter and aspect ratio of the pipe section. The calculated pressure values are compared with the experimentally measured ones to validate the simulation results. An excellent conformity of the calculated and measured pressures is observed. With the aim to evaluate the homogeneity of gas distribution through the pipe holes the nonuniformity coefficient (Φ) was created. The results show the influence of each layout parameter in the homogeneity of the gas distribution. Hence in future correct technical layouts of gas feed-in systems can easily be applied. With these results construction guidelines has been formulated.
Achieving a reasonable homogeneity of the coating deposition rate within a low-pressure plasma process is a challenge, especially in large volume chambers. The local gas flow behavior is one key parameter in the coating deposition. Basically, with the exception of the product geometry and the electrode design, there are two main influences on the gas flow distribution inside a large volume chamber: 1) gas feed-in system and 2) gas exhaustion system. This work focuses on the gas exhaustion system with the aim to reduce its influence on the gas flow behavior inside a large plasma coater. In this sense, a solution with a perforated plate, named "Baffle-Plate", is created. Thereby relevant construction parameters are identified and investigated to understand their influence in respect to the homogeneity of the gas exhaustion. Number of holes, hole diameter, distance of the Baffle-Plate to the top of the chamber, gas flow and chamber volume are evaluated parameters. Computational fluid dynamics (CFD) simulations are used as a tool to determine velocity and pressure distribution inside the PECVD-chamber and, consequently, to evaluate the layout parameters of the Baffle-Plate. Additionally, practical coating experiments with and without the Baffle-Plate installed are performed. The results show a correlation between the gas flow distribution and the homogeneity of the coating deposition rate. With these results construction guidelines have been formulated. Hence in future developments correct technical layouts of the Baffle-Plate can be applied, easily.
An investigation into strongly organosilicon plasma‐polymeric coatings has been performed with the goal of developing a deeper understanding of the relationship between the physical properties and the chemical structure. The overall elemental composition has been analyzed using X‐ray photoelectron spectroscopy (XPS) and micro elemental analysis. Additional XPS peak fitting and Fourier‐transform infrared spectroscopy analysis have been undertaken and physical properties such as Young's modulus and mass density have been determined. The chemical structure of the coatings is discussed taking into account conventional Si–O crosslinking and also an independent second bridge‐building mechanism. Based on this suggestion, a least‐squares algorithm has been used to calculate the network structure including a new index for the degree of crosslinking. This enables very similar plasma‐polymeric coatings to be distinguished.
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