Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography

Vogler, Marko; Wiedenberg, Sabine; Mühlberger, M.; Bergmair, Iris; Glinsner, T.; Schmidt, Holger; Kley, Ernst‐Bernhard; Grützner, Gabi

doi:10.1016/j.mee.2007.01.184

Cited by 75 publications

(39 citation statements)

References 16 publications

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“…On the other hand, geometric structures including rough structures and regular micro/nano patterns are also crucial [13,14]. To obtain polymer regular micro/ nano geometric surfaces, various nanoprocessing approaches can be employed, including nanoporous template wetting [15], capillary lithography [16], nanoimprint lithography [17], microstereolithography [18], template rolling press [19], and water spreading of carbon nanotubes [20]. A number of theoretical and experimental studies indicated that polymer aligned nanopillar arrays or carbon nanotube arrays could exhibit hydrophobic or surperhydrophobic feature [21][22][23][24].…”

Section: Introductionmentioning

confidence: 99%

Wettability transition of plasma-treated polystyrene micro/nano pillars-aligned patterns

Kong¹,

Yung²,

Xu³

et al. 2010

Express Polym. Lett.

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Abstract. This paper reports the wettability transition of plasma-treated polystyrene (PS) micro/nano pillars-aligned patterns. The micro/nano pillars were prepared using hot embossing on silicon microporous template and alumina nanoporous template, which were fabricated by ultraviolet (UV) lithography and inductive coupled plasma (ICP) etching, and two-step anodic oxidation, respectively. The results indicate that the combination of micro/nano patterning and plasma irradiation can easily regulate wettabilities of PS surfaces, i.e. from hydrophilicity to hydrophobicity, or from hydrophobicity to superhydrophilicity. During the wettability transition from hydrophobicity to hydrophilicity there is only mild hydrophilicity loss. After plasma irradiation, moreover, the wettability of PS micro/nano pillars-aligned patterns is more stable than that of flat PS surfaces. The observed wettability transition and wettability stability of PS micro/nano pillars-aligned patterns are new phenomena, which may have potential in creating programmable functional polymer surfaces.

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Section: Introductionmentioning

confidence: 99%

Wettability transition of plasma-treated polystyrene micro/nano pillars-aligned patterns

Kong¹,

Yung²,

Xu³

et al. 2010

Express Polym. Lett.

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“…This presents particular difficulties when aiming for a roller-imprinting process as we do, although it has been reported to work successfully [151]. Nevertheless, we aim for UV-curing processes, since they are more promising for high throughput processes [152]. In UV-curing NIL, the minimal process time is determined by the filling of the stamp´s cavities, which can be quick due to very low viscous resists, and the necessary exposure dose to guarantee a sufficient cross-linking of the resist.…”

Section: Stamp Fabricationmentioning

confidence: 95%

“…Critical characteristics are adhesion to the stamp and to the substrate, UV-curability and low viscosity (especially for thin layers / small features). A process was set using the material mr-UVCur06 from Micro Resist Technology [152]. This resist is a low viscous free-radical curing material especially designed for UV-NIL processes.…”

Section: Conventional Nilmentioning

confidence: 99%

Nanoimprint lithography for solar cell texturisation

et al. 2010

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The highest efficiency silicon solar cells are fabricated using defined texturing schemes by applying etching masks. However, for an industrial production of solar cells the usage of photolithographic processes to pattern these etching masks is too consumptive. Especially for multicrystalline silicon, there is a huge difference in the quality of the texture realized in high efficiency laboratory scale and maskless industrial scale fabrication. In this work we are describing the topography of a desired texture for solar cell front surfaces. We are investigating UV-nanoimprint lithography (UV-NIL) as a potential technology to substitute photolithography and so to enable the benefits resulting of a defined texture in industrially feasible processes. Besides the reduced process complexity, UV-NIL offers new possibilities in terms of structure shape and resolution of the generated etching mask. As mastering technology for the stamps we need in the UV-NIL, interference lithography is used. The UV-NIL process is conducted using flexible UV-transparent stamps to allow a full wafer process. The following texturisation process is realized via crystal orientation independent plasma etching to tap the full potential of the presented process chain especially for multicrystalline silicon. The textured surfaces are characerised optically using fourier spectroscopy

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“…UV-curable monomers are very important factor for a success of UV-nanoimprint technique. For this technique, the UV-curable Amonil polymer (AMO GmbH, Germany) with a viscosity of about 50 mPas was used in many works [17][18][19][20], while a novel low-viscosity polymer with a viscosity of about one third that of Amonil and spin ability down to 150 nm thick has been recently developed [21]. …”

Section: Soft Lithography and Nanoimprint Lithographymentioning

confidence: 99%

“…Masked lithography makes use of masks or molds to transfer patterns over a large area simultaneously, thus, enabling a high-throughput fabrication up to several tens of wafers/hr. The forms of masked lithography include photolithography [1][2][3][4][5][6][7][8][9][10], soft lithography [11][12][13], and nanoimprint lithography [14][15][16][17][18][19][20][21]. On the other hand, maskless lithography, such as electron beam lithography [22][23][24][25][26][27][28][29], focused ion beam lithography [30][31][32][33], and scanning probe lithography [34][35][36][37][38][39][40][41][42][43][44], fabricates arbitrary patterns by a serial writing without the use of masks.…”

Section: Introductionmentioning

confidence: 99%

Review on Micro- and Nanolithography Techniques and their Applications

2012

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Abstract. This article reviews major micro-and nanolithography techniques and their applications from commercial micro devices to emerging applications in nanoscale science and engineering. Micro-and nanolithography has been the key technology in manufacturing of integrated circuits and microchips in the semiconductor industry. Such a technology is also sparking revolutionizing advancements in nanotechnology. The lithography techniques including photolithography, electron beam lithography, focused ion beam lithography, soft lithography, nanoimprint lithography and scanning probe lithography are discussed. Furthermore, their applications are summarized into four major areas: electronics and microsystems, medical and biotech, optics and photonics, and environment and energy harvesting.

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Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography

Cited by 75 publications

References 16 publications

Wettability transition of plasma-treated polystyrene micro/nano pillars-aligned patterns

Wettability transition of plasma-treated polystyrene micro/nano pillars-aligned patterns

Nanoimprint lithography for solar cell texturisation

Review on Micro- and Nanolithography Techniques and their Applications

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