We report on low-resistivity thermally stable ohmic contacts to p-GaN using ZrN/ZrB 2 metallisation. Transport properties, thermal conductivity and long-term stability of contacts were examined. pGaN/ZrN/ZrB 2 contacts show excellent stability upon aging in air, indicating their suitability for longterm operation at temperatures up to 150 ºC.1 Introduction GaN's intrinsic properties such as wide bandgap, high thermal conductivity, high melting temperature, high breakdown voltage and high saturation velocity make it a material of choice for high temperature and high power electronic devices [1]. During the last decade, significant progress in both material and processing technologies as well as in the design of new device structures has been made. Now the most important and challenging problem is to master the reliability of GaN-based devices.In this paper we address the issue of long-term stability of ohmic contacts to GaN. Electrical contacts that are structurally stable at high temperature are the prerequisite for reliable operation of GaN electronic devices. Zr-based metallisation was chosen as a contact material because of high electrical conductivity, superior thermal stability and chemical resistance against corrosion, making it compatible with GaN. Zr/ZrN metallisation was reported effective in providing low-resistivity contacts to n-type GaN by depleting its superficial film from nitrogen, creating thus a highly doped subcontact region and a stable ZrN compound at the contact interface [2]. In our previous studies, ZrN/ZrB 2 metallisation was used for p-type GaN contacting purposes. The presence of Zr in the metallisation was a key factor for the formation of the ohmic contact by removal hydrogen from the subcontact layer and creation thereby a highly doped p + region [3]. Moreover, structural stability of ZrN/ZrB 2 metallisation deposited on GaN upon annealing up to 1100 °C in N 2 has been proven [4]. In the present study we have investigated the thermal conductivity of p-GaN/ZrN/ZrB 2 ohmic contacts and performed accelerated lifetime testing of these contacts. It is well established that efficient heat removal is critical to the performance of semiconductor devices. Thus for thermal management of the device, it is important to know accurately the value of the thermal conductivity of metallisation and semiconductor subcontact region. Thermal conductivity investigations were performed using Scanning Thermal Microscopy (SThM), enabling to couple the topographic image with the thermal conductivity information [5]. To age the contacts they were annealed in air at temperatures up to 150 °C over a period of 300 hours. The aging process was monitored by specific contact resistance measurements and compositional depth profiling of the contacts.