The temperature dependence of the capture cross section of negatively charged gold centers in n‐type silicon for holes σ p− is determined in the temperature range of 55 K ≦ T ≦ 340 K from the temperature dependent breakdown voltage UBD of gold compensated pin diodes showing a negative differential resistance region. The temperature dependence of the capture cross section of neutral gold centers in the range of 193 K ≦ T ≦ 320 K, which was obtained in an earlier paper, is confirmed by means of small signal pulse measurements in the high injection regime of the same double injection diodes. The over‐temperature caused by Joule heating in current filaments occurring in the high injection region of the stationary S‐shaped I–U characteristic is measured for the first time using a large signal pulse method.