Determination of the optical constants of diamond films with a rough growth surface

Yin, Zhipeng; Tan, H.S.; Smith, F. W.

doi:10.1016/s0925-9635(96)00562-6

Cited by 36 publications

(17 citation statements)

References 5 publications

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“…no absorption in the layer and good optical quality) and from the modulation depth of interference fringes in non-absorbing region, we can determine index of refraction n=2.32 in the middle IR region (compared to n=2.38 of IIa diamond [12]). Suppression of interference fringes in the visible and disappearance in the UV region is due to light scattering, the roughness to wavelength ratio being the decisive parameter [13,14]. Nanodiamond samples exhibit surface conductivity in the "as grown" state and they are photosensitive.…”

Section: Resultsmentioning

confidence: 99%

Thin nanodiamond membranes and their microstructural, optical and photoelectrical properties

Mortet

D’Haen²,

Potmesil

et al. 2005

Diamond and Related Materials

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We have grown variety of thin nanocrystalline diamond thin layers on silicon substrates with thicknesses ranging from 100 to 2000 nm. Using a bias enhanced nucleation for nucleation density over 10 10 cm -2 and changing the deposition conditions and/or using argon dilution we have obtained nanodiamond layers of different structural properties. The nucleation process and growth was monitored with Scanning Electron Microscopy (SEM); cross-section SEM and micro-Raman measurements were used to access the nanodiamond microstructure. Surface topography was followed by SEM and Atomic Force Microscopy. Windows were opened in the silicon substrate to get self-supporting diamond membrane. Diamond membranes are very smooth, homogeneous and transparent from UV to IR. Fourier Transform Photocurrent Spectroscopy has been used to access main electronic defects in the gap of this material. New defects were observed with photoionization energy of 0.37 and 0.40 eV.

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Section: Resultsmentioning

confidence: 99%

Thin nanodiamond membranes and their microstructural, optical and photoelectrical properties

Mortet

D’Haen²,

Potmesil

et al. 2005

Diamond and Related Materials

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“…II A. 24 Calculated values of the optical absorption coefficient ␣ for the sample from Fig. 3 are shown in Fig.…”

Section: Resultsmentioning

confidence: 99%

Optical absorption and light scattering in microcrystalline silicon thin films and solar cells

Poruba

Fejfar

Remeš

et al. 2000

Journal of Applied Physics

247

148

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Optical characterization methods were applied to a series of microcrystalline silicon thin films and solar cells deposited by the very high frequency glow discharge technique. Bulk and surface light scattering effects were analyzed. A detailed theory for evaluation of the optical absorption coefficient ␣ from transmittance, reflectance and absorptance ͑with the help of constant photocurrent method͒ measurements in a broad spectral region is presented for the case of surface and bulk light scattering. The spectral dependence of ␣ is interpreted in terms of defect density, disorder, crystalline/amorphous fraction and material morphology. The enhanced light absorption in microcrystalline silicon films and solar cells is mainly due to a longer optical path as the result of an efficient diffuse light scattering at the textured film surface. This light scattering effect is a key characteristic of efficient thin-film-silicon solar cells.

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“…In order to take into account the effect of the surface roughness on the optical properties, the model proposed by Filinski has been used [21]. The reflection and the transmission of a beam emitted by a substrate through a film have been previously described [22]. The scattering factors S int and S t for a film surface with root mean square roughness σ are given by [22]:…”

Section: Theory and Methodologymentioning

confidence: 99%

Diagnostic in TCOs CVD processes by IR pyrometry

Maury¹,

Duminica²

2007

Thin Solid Films

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OATAO is an open access repository that collects the work of Toulouse researchers and makes it freely available over the web where possible. AbstractInfra red pyrometry is a sensitive, simple and low-cost technique commonly used for the measurement of the deposition temperature in CVD processes. We demonstrate in this work that this optical technique can be used as diagnostic tool to provide fruitful informations during the growth under atmospheric pressure of TiO 2 films on various substrates chosen as an example of transparent oxide. Significant variations of the pyrometric signal were observed during the deposition of TiO 2 thin films due to interferences in the growing film resulting from multi-reflections at the interfaces and scattering induced by the surface roughness. Modeling of the time dependence of the IR pyrometric signal allows simultaneously the determination of the layer thickness, the growth rate, surface roughness and refractive index of the thin films under the growth conditions. This diagnostic technique can be used for various transparent thin films grown on opaque substrates and is well adapted to control CVD processes operating either under atmospheric or low pressure and more generally any thermal treatment processes.

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Determination of the optical constants of diamond films with a rough growth surface

Cited by 36 publications

References 5 publications

Thin nanodiamond membranes and their microstructural, optical and photoelectrical properties

Thin nanodiamond membranes and their microstructural, optical and photoelectrical properties

Optical absorption and light scattering in microcrystalline silicon thin films and solar cells

Diagnostic in TCOs CVD processes by IR pyrometry

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