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AbstractTiO 2 thin films were deposited under atmospheric pressure by MOCVD in the temperature range 400-600°C on stainless steel and Si (100) substrates. Titanium tetraisopropoxide (TTIP) was used as Ti and O source. Single-phased anatase and bi-phased (anatase/rutile) coatings with controlled composition have been deposited depending on the temperature and the TTIP mole fraction. The films grown on stainless steel at low temperature (b 420°C) and low TTIP mole fraction (b10 − 4 ) are constituted of pure anatase and they exhibit a high photocatalytic activity under UV light and a high hydrophilicity. In the temperature range 430-600°C the rutile starts growing leading to anatase/rutile mixtures and subsequently to a progressive decrease of both photocatalytic activity and wettability. Correlations between functional properties and microstructure of the films are discussed.
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