Proceedings of the 35th Annual Conference on Design Automation Conference - DAC '98 1998
DOI: 10.1145/277044.277179
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Design and optimization of low voltage high performance dual threshold CMOS circuits

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Cited by 185 publications
(104 citation statements)
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“…Gated-V dd can be coupled with a dual-threshold voltage (dual-V t ) process technology to achieve even larger reductions in leakage [9]. SRAM cells use low-V t transistors to maintain high speed and the gated-V dd transistors use high-V t to achieve additional leakage reduction.…”
Section: Gated-v Dd Circuit Techniquesmentioning
confidence: 99%
“…Gated-V dd can be coupled with a dual-threshold voltage (dual-V t ) process technology to achieve even larger reductions in leakage [9]. SRAM cells use low-V t transistors to maintain high speed and the gated-V dd transistors use high-V t to achieve additional leakage reduction.…”
Section: Gated-v Dd Circuit Techniquesmentioning
confidence: 99%
“…To eliminate the glitch power, additional ILP constraints determine the positions and values of the delay elements to be inserted to balance path delays. Unlike the heuristic algorithms [2][3][4][5], this ILP gives us a globally optimal solution.…”
Section: Integer Linear Programmingmentioning
confidence: 99%
“…Dual-V th assignment [2][3][4][5][6] is an efficient technique to decrease leakage power. Wei et al [3] describe an algorithm to find the optimal high V th for different circuit structure.…”
Section: Introductionmentioning
confidence: 99%
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