Design and Manufacturing Method of Fundamental Beam Mode Shaper for Adapted Laser Beam Profile in Laser Material Processing

Bischoff, Christian; Völklein, F.; Schmitt, Jana; Rädel, Ulrich; Umhofer, Udo; Jäger, Erwin; Lasagni, Andrés Fabían

doi:10.3390/ma12142254

Cited by 13 publications

(8 citation statements)

References 38 publications

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“…To generate ring shaped output pixels, which commonly find uses in materials processing [24,25] and optical particle manipulation [26], an adjustable axicon phase can be employed:…”

Section: Ring Pixelsmentioning

confidence: 99%

HoloTile light engine: new digital holographic modalities and applications

Glückstad,

Gejl Madsen

2024

Rep. Prog. Phys.

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HoloTile is a patented computer generated holography approach with the aim of reducing the speckle noise caused by the overlap of the non-trivial physical extent of the point spread function in Fourier holographic systems from adjacent frequency components. By combining tiling of phase-only of rapidly generated sub-holograms with a PSF-shaping phase profile, each frequency component - or output ``pixel" - in the Fourier domain is shaped to a desired non-overlapping profile. In this paper, we show the high-resolution, speckle-reduced reconstructions that can be achieved with HoloTile, as well as present new HoloTile modalities, including an expanded list of PSF options with new key properties. In addition, we discuss numerous applications for which HoloTile, its rapid hologram generation, and the new PSF options may be an ideal fit, including optical trapping and manipulation of particles, volumetric additive printing, information transfer and quantum communication.

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“…To generate ring shaped output pixels, which commonly find uses in materials processing [24,25] and optical particle manipulation [26], an adjustable axicon phase can be employed:…”

Section: Ring Pixelsmentioning

confidence: 99%

HoloTile light engine: new digital holographic modalities and applications

Glückstad,

Gejl Madsen

2024

Rep. Prog. Phys.

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“…During nanosecond-pulsed laser processing of metals, the structuring mechanism is mainly based on recoil vapour pressure and Marangoni convection, that have an effect on the overall picture of melt flow [20,21]. Since the local intensity at the interference maxima positions is directly related to the intensity distribution in the laser beam profile, the use of a round Gaussian beam leads to inhomogeneous surface textures due to the non-uniform intensity distribution of the input laser beam [22,23]. However, most commercial lasers provide beams with Gaussian (TEM00) intensity distribution.…”

Section: Introductionmentioning

confidence: 99%

Utilizing a Diffractive Focus Beam Shaper to Enhance Pattern Uniformity and Process Throughput during Direct Laser Interference Patterning

El-Khoury

Voisiat

Kunze³

et al. 2022

Materials

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Uniform periodic microstructure formation over large areas is generally challenging in Direct Laser Interference Patterning (DLIP) due to the Gaussian laser beam intensity distribution inherent to most commercial laser sources. In this work, a diffractive fundamental beam-mode shaper (FBS) element is implemented in a four-beam DLIP optical setup to generate a square-shaped top-hat intensity distribution in the interference volume. The interference patterns produced by a standard configuration and the developed setup are measured and compared. In particular, the impact of both laser intensity distributions on process throughput as well as fill-factor is investigated by measuring the resulting microstructure height with height error over the structured surface. It is demonstrated that by utilizing top-hat-shaped interference patterns, it is possible to produce on average 44.8% deeper structures with up to 60% higher homogeneity at the same throughput. Moreover, the presented approach allows the production of microstructures with comparable height and homogeneity compared to the Gaussian intensity distribution with increased throughput of 53%.

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“…The maximum tolerable roughness is defined by fractions of the used wavelength λ, e.g., λ 100 or better, whereas the overall size and shape of the elements can easily reach the millimeter or centimeter range. Next to the industrially established ion beam polishing approaches for optical surfaces with ultra low surface roughness, reactive ion etching (RIE) has been demonstrated for the efficient realization of highly precise microstructured optical surfaces for beam-shaping 1,2 and beam-splitting, 3 as well as for imaging 4 and illumination 5,6 applications. During RIE, material transport is achieved by a combination of physical and chemical (reactive) interaction of ions and reactive gases with the surface in a plasma reactor.…”

Section: Introductionmentioning

confidence: 99%

Perspectives of reactive ion etching of silicate glasses for optical microsystems

Weigel

Brokmann

Hofmann

et al. 2021

J. Optical Microsystems

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We provide a review of the latest research findings as well as the future potential of plasma-based etching technology for the fabrication of micro-optical components and systems. Reactive ion etching (RIE) in combination with lithographic patterning is a well-established technology in the field of micro-and nanofabrication. Nevertheless, practical implementation, especially for plasma-based patterning of complex optical materials such as alumino-silicate glasses or glass-ceramics, is still largely based on technological experience rather than established models. Such models require an in-depth understanding of the underlying chemical and physical processes within the plasma and at the glass-plasma/mask-plasma interfaces. We therefore present results that should pave the way for a better understanding of processes and thus for the extension of RIE processes toward innovative three-dimensional (3D) patterning as well as for the processing of chemically and structurally inhomogeneous silicate-based substrates. To this end, we present and discuss the results of a variety of microstructuring strategies for different application areas with a focus on micro-optics. We consider the requirements for refractive and diffractive micro-optical systems and highlight potentials for 3D dry chemical etching by selective tailoring of the material structure. The results thus provide first steps toward a knowledge-based approach to RIE processing of universal dielectric glass materials for optical microsystems, which also has a significant impact on other microscale applications. © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 International License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Design and Manufacturing Method of Fundamental Beam Mode Shaper for Adapted Laser Beam Profile in Laser Material Processing

Cited by 13 publications

References 38 publications

HoloTile light engine: new digital holographic modalities and applications

HoloTile light engine: new digital holographic modalities and applications

Utilizing a Diffractive Focus Beam Shaper to Enhance Pattern Uniformity and Process Throughput during Direct Laser Interference Patterning

Perspectives of reactive ion etching of silicate glasses for optical microsystems

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