Deposition of γ-FeOOH, Fe3O4 and Fe on Pd-catalyzed substrates

Chemical Bath Deposition

“…• Electroless deposition (ED) entails a change in the oxidation state of the dissolved metal cation to an insoluble state in the deposition medium, followed by catalyzed deposition of the solid at a "sensitized" substrate without use of externally imposed sources of electrical energy [17]. This technique is an adaptation of electroless plating techniques that are widely used for depositing metal films.…”

“…This technique is an adaptation of electroless plating techniques that are widely used for depositing metal films. In a recent example [17], films of β-FeOOH or Fe 3 O 4 were deposited from iron (III) nitrate solutions, and Fe from iron (III) sulfate solution, on amine-functionalized Si that had been immersed in a Pd salt solution for sensitization; dimethylamine borane complex (DMAB, (CH 3 ) 2 NHBH 3 ) in the deposition medium served as the reducing agent. Table 14.1 summarizes the oxide materials (and a few sulfides) that have been deposited in the form of thin films via these techniques or with the use of organic self-assembled monolayer surfaces (vide infra).…”

Nano/Micro-Patterning of Metal Oxide Nanocrystals

“…Supersaturation of solution can be changed by pH value as discussed in ref. 55. TiO 2 thin films can be formed fast by the deposition of homogeneously nucleated particles at high pH condition such as pH 3.88, and uniform films can be obtained slowly by heterogeneous nucleation at low pH condition.…”

“…Catalyst solution containing Na 2 PdCl 4 (0.38 mM) and NaCl (0.01 M) in a 0.01 M 2-morpholinoethane sulfonate pH 5 aqueous buffer was prepared 54,55 . The details of preparation of this solution are described in the reference 56 .…”

Recent progress in the synthesis of oxide films from liquid solutions

“…This technique is an adaptation of electroless plating techniques that are widely used for depositing metal films. In a recent example, 43) films of β -FeOOH, Fe3O4, or Fe were deposited on amine-functionalized Si that had been immersed in a Pd salt solution for sensitization; dimethylamine borane complex (DMAB, (CH3)2NHBH3) in the deposition liquid served as the reducing agent.…”