Deposition of TiO2 on silicon by sputtering in hollow cathode

Araújo, F.O. de; Almeida, Edalmy Oliveira de; Alves, Clodomiro; Costa, J.A.P. da; Dumelow, T.

doi:10.1016/j.surfcoat.2006.06.015

Cited by 15 publications

(6 citation statements)

References 7 publications

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“…Under the conditions employed in the present study (450 °C for 1 h), the plasma, nitriding and oxidation treatments applied to Ti were able to bombard the surface with nitrogen and oxygen ions, respectively. Thus, some Ti atoms were removed when reacting with N and O from the plasma and became available on the material surface, in the form of nitrides and oxides [36,37]; however, the films produced by the treatments were very thin, with magnitudes in the order of nanometers, estimated by the difference in peak intensity for different incidence angles in GIXRD, which could not be perceived using conventional Xray diffraction analysis (Bragg -Brentano configuration). Therefore, the GIXRD technique was applied, which, due to the small depth of beam penetration in the deposited layer, provided information on the treatment diffusion profile.…”

Section: Discussionmentioning

confidence: 99%

Live endothelial cells on plasma-nitrided and oxidized titanium: An approach for evaluating biocompatibility

Braz

Martins

Morales

et al. 2020

Materials Science and Engineering: C

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Section: Discussionmentioning

confidence: 99%

Live endothelial cells on plasma-nitrided and oxidized titanium: An approach for evaluating biocompatibility

Braz

Martins

Morales

et al. 2020

Materials Science and Engineering: C

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“…Conversely, the plasma jet system is intended for local surface treatment and its use for deposition onto substrates of larger areas introduces difficulties. The discharge plasma in the system has already been studied in many different experimental arrangements and with various operation parameters (see, e.g., de Araújo et al 2006, Schrittwieser et al 2010. The experiments with the system were dedicated in the first place to the deposition of special materials with utilization in various fields of industry.…”

Section: Introductionmentioning

confidence: 99%

Measurement of the plasma and neutral gas flow velocities in a low-pressure hollow-cathode plasma jet sputtering system

Klusoň¹,

Kudrna²,

Tichý³

2012

Plasma Sources Sci. Technol.

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We present results from two mutually independent measurements of plasma and neutral gas flow velocities in a plasma jet deposition system. Operation of a hollow-cathode discharge within the plasma jet nozzle in the pulse regime enables the simple use of a classical Langmuir probe for the plasma flow velocity measurement. In this method, we assume that the plasma is generated solely inside the nozzle during the power impulse and we measure the time of flight of the ions along a known distance between the nozzle end and the probe. The plasma velocity at the plasma jet axis is then determined by differentiation of the dependence of the distance covered by ions on time. As the second method the well-known Pitot tube is used for measurement of the neutral gas velocity. By comparison of both methods we have experimentally proved that the neutral gas flow velocity is almost unaffected by the presence of the plasma, i.e. it does not substantially depend on whether the discharge is switched on or off. The results of both methods correspond well; detected differences are qualitatively explained. It is documented that the plasma jet can be operated both in a subsonic and in a supersonic regime. We present the dependences of the plasma and neutral gas flow velocity on the distance from the cathode, on the pressure in the reactor chamber, and on the flow rate of the working gas.

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“…one of the best photocatalysts with remarkable activity and non-toxic properties 10 . It is also used in photochemical solar cells 2 and as gas sensors 6 .…”

Section: Abstract: Titanium Nitride Cathodic Cage Titanium Dioxidementioning

confidence: 99%

“…In conventional deposition processes, the pressure is very low, about 10 -3 mba [7][8][9][10] . Thin films of Titanium oxide (TiO) and Titanium dioxide (TiO2) have received a great deal of attention worldwide due to their numerous applications in several fields, mainly because of properties such as chemical stability, low toxicity, relatively low cost, high refractive and permittivity index, broadband valence, good chemical stability and high transmittance 1,2,4,9 .…”

Section: Introductionmentioning

confidence: 99%