Deposition of hydrogenated amorphous CNx film in CH4/N2 RF discharge

Spectroscopic visualization of CH in methane/hydrogen plasmas for synthesis of carbonaceous materials and surface micromorphology

“…Tahara et al reported diamond-like carbon (DLC) films prepared by plasma-assisted CVD [3]. Many studies have been performed on the synthesis mechanisms of the DLCs, which are very attractive materials for hard manufacturing tools and excellent electrical insulating films [4][5][6][7][8][9]. However, the interaction between a plasma and a substrate target surface is not clear because particle-species compositions, temperatures and densities of the plasma as well as plasma behaviors near the surface cannot easily be measured even with recent advanced diagnostic methods [3].…”

Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature

“…There are five component bands in this region: bands which are attributed to both nitrile (−C≡N) and isonitrile (−N≡C) bands [29,31]; isolated and/or fused aromatic rings bonded either to isonitrile (−N≡C) at 2105 cm −1 or nitrile (−C≡N) at 2215 cm −1 ; hydrocarbon molecules bonded to isonitrile (−N≡C), including C 2 H 5 and CH 3 at 2160 cm −1 and 2190 cm −1 , respectively; and wavenumber of 2245 cm −1 , associated with the hydrocarbon groups (CH 3 , C 2 H 5 , etc.) bonded to nitrile (−C≡N).…”

Amorphous carbon nitride thin films for electrochemical electrode: Effect of molecular structure and substrate materials

“…As shown in Fig. 11, there were mainly two peaks at 2180 cm À1 and 2130 cm À1 assigned as nitrile (R-C"N) or unstable isonitrile (R-N + "C À ) absorption and carbodiimide (-N@C@N-) absorption, respectively [40]. Both peaks were increased by changing the substrate material from Si to Pt and hyd-Pt.…”