Deposition of diamond films on single crystalline silicon carbide substrates

Mukherjee, Debarati; Oliveira, F.J.; Trippe, S.C.; Rotter, Shlomo; Neto, M.A.; Silva, Rui; Mallik, Asok K.; Haenen, Ken; Zetterling, Carl-Mikael; Mendes, Joana Catarina

doi:10.1016/j.diamond.2019.107625

Cited by 12 publications

(11 citation statements)

References 42 publications

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Section: Discussionmentioning

confidence: 99%

“…However, at sufficiently low temperature, the growth rates of the sp 2 and a-C phases appear significantly dominant compared to their etching rates by atomic H. Thus, the growth of NCD/MCD films is not realized. To facilitate easier nucleation during the development of the nanodiamond phase on glass substrates, utilizing CH 4 as the conventional carbon source diluted by H 2 or Ar gas, most of the early studies unavoidably adopted the prenucleation on the substrate surface by diamond powder or using different mechanical seeding procedures, 52 and also by applying a strong negative d.c. substrate bias. 53−55 Using microwave plasma CVD (MWPCVD) in conventional as well as its various modes, e.g., the pulsed mode, the surfacewave mode, linear antennas, and the magnetoactive mode, deposition of different categories of diamond on Si and quartz substrates proceeds at temperatures of ∼100−750 °C via efficiently suppressing the excessive carbon decomposition by virtue of low electron temperature over the CVD plasma.…”

Section: ■ Discussionmentioning

confidence: 99%

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Growth of Nanostructured Diamond Films on Glass Substrates by Low-Temperature Microwave Plasma-Enhanced Chemical Vapor Deposition for Applications in Nanotribology

Das

Roy

2022

ACS Appl. Nano Mater.

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Low-temperature fabrication of superior nano-/microcrystalline diamond (NCD/MCD) films is a major thrust in diamond technology. The widely used seeding techniques applied on the substrate surface are usually harsh, lead to defect formation, and suffer from the lack of reproducibility in maintaining homogeneity and uniformity over nano-/microdimensions. Low-temperature growth of a significant diamond phase on purely untreated glass substrates is indeed a challenging task. Using CO2 as the supplementary gas-phase constituent included in the (CH4 + H2)-plasma and a specific shadow-mask assembly to generate the diffuse plasma environment above the growth zone, the present experiment succeeds in the spontaneous growth of nanocrystalline diamond (NCD), including microcrystalline diamond (MCD) of an average crystal size of ∼0.9–1.2 μm at ∼300 °C on glass substrates, without any seeding pretreatment. In the plasma, the shadow mask establishes a virtual remote plasma configuration in setting the diffuse plasma, protects the growth surface from a direct bombardment of energetic ions, generates negative self-bias on the substrate, and, importantly, promotes significant gas-phase nucleation dominant over typical solid-state nucleation. The incubation of diamond embryo clusters onto the untreated glass substrates under the shadow-mask structure and its growth evolution through the efficient transport of the preferential carbonaceous precursors proceed within the diffuse plasma. In the course of network modification under the diffuse plasma, atomic O remains instrumental for efficient etching of the a-C overlayer on a diamond embryo and atomic H, with its small physical dimension, conveniently penetrates within the diamond network and promotes crystallization via transferring its moderate chemical energy to the diamond lattice. The low-temperature-grown nanostructured diamond films are up-and-coming for applications in nanotribology.

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Section: Discussionmentioning

confidence: 99%

Section: ■ Discussionmentioning

confidence: 99%

Growth of Nanostructured Diamond Films on Glass Substrates by Low-Temperature Microwave Plasma-Enhanced Chemical Vapor Deposition for Applications in Nanotribology

Das

Roy

2022

ACS Appl. Nano Mater.

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“…Plasma treatments have also been used in the past on other surfaces to facilitate electrostatic seeding. [98][99][100][101][102][103] This should not be confused with the combinatorial seeding technique (discussed later) 67,68,104 in which a thin carbon layer is formed on the substrate before electrostatic seeding. The measured z-potential of any surface gives the average over certain area or certain volume of liquid at a given pH.…”

Section: Electrostatic Seedingmentioning

confidence: 99%

“…The small size of the particle can be helpful in the formation of thin diamond films. More recently this process has been used by Mukherjee et al 104 for growing diamond on silicon carbide. Other mixed techniques have been the use of scratching in combination with carbon deposition or other metal deposition.…”

Section: Nucleation Of Diamondmentioning

confidence: 99%

Nucleation of diamond films on heterogeneous substrates: a review

Mandal

2021

RSC Adv.

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“…In present industrial applications, nanocrystalline diamond (NCD) is used as a mechanically highly stable and reliable material, e.g., in clockworks, as surgery instruments and also MEMS devices. [3][4][5] Deposition of diamond by means of chemical vapor deposition technologies (CVD) on blank or coated silicon wafers is widely used, [3,4,6,7] whereas the low-temperature deposition of diamond films at temperatures <400 °C is challenging. [8][9][10] In previous work, also diamond-based pressure sensors were discussed, using either a diamond diaphragm in rigid diamond [11,12] or thin layers of diamond on glass.…”

Section: Introductionmentioning

confidence: 99%

Pressure Sensor Devices Featuring a Chemical Passivation Made of a Locally Synthesized Diamond Layer

Bähr

Käpplinger

Pobedinskas

et al. 2022

Physica Status Solidi (a)

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The rear side of a pressure sensor diaphragm is prepared with an additional diamond layer as protective coating against harsh media. The preparation sequence for the diamond coating is developed as a simple backend process, combining only two additional steps in the standard process. These are the local seeding of nanodiamond layer and the low‐temperature diamond growth at <300 °C in a linear antenna microwave plasma‐enhanced chemical vapor deposition reactor, where only at the nanodiamond seeded sites, a high‐quality diamond film was synthesized. The seeding resolution in the setup used was limited to ≈80 μm, but can be further reduced. In an industry‐typical assembly sequence the diamond coated pressure sensor devices are further equipped with a support wafer and mounted to a TO‐8 socket. Tests of such sensor systems indicate that the diamond layer does not hamper the stability of the device. This proofed method of postprocessing an only‐local and low‐temperature synthesis of a diamond layer on the wafer‐level opens‐ up possibilities for many other applications, since this approach is scalable and in general cost effective.

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Deposition of diamond films on single crystalline silicon carbide substrates

Cited by 12 publications

References 42 publications

Growth of Nanostructured Diamond Films on Glass Substrates by Low-Temperature Microwave Plasma-Enhanced Chemical Vapor Deposition for Applications in Nanotribology

Growth of Nanostructured Diamond Films on Glass Substrates by Low-Temperature Microwave Plasma-Enhanced Chemical Vapor Deposition for Applications in Nanotribology

Nucleation of diamond films on heterogeneous substrates: a review

Pressure Sensor Devices Featuring a Chemical Passivation Made of a Locally Synthesized Diamond Layer

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