Deposition of Carbon Thin Film by Means of a Low-Frequency Plasma Sputtering Using Battery Carbon Rods as a Target

Purkuncoro, Aladin Eko; Santjojo, Dionysius Joseph Djoko Herry; Irawan, Yudy Surya; Soenoko, Rudy

doi:10.1088/1757-899x/515/1/012041

Cited by 3 publications

(9 citation statements)

References 7 publications

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“…As follows from the Table 2 and Fig. 4, however, if this refers to previous research that solved the problem of successfully depositing carbon of carbon rod from waste of ABC battery which has 81.94 % of atomic carbon on a glass substrate using plasma sputtering [1]. Based, on these results, the carbon of carbon rods from ABC battery waste has potential to be used as a target material for deposition of carbon thin films on SKD11 steel substrate.…”

Section: Discussion Of the Research Results Of Hardness Value Of Carbmentioning

confidence: 93%

“…The other studies also have been carried out by deposition of carbon thin film with LFG plasma sputtering power treatment of 220 W, 260 W, 320 W, and 340 W on glass using battery carbon rods as target. But, the result only discuss about FTIR results of carbon sputtering with various power [1].…”

Section: Discussion Of the Research Results Of Hardness Value Of Carbmentioning

confidence: 99%

“…Previous research on deposition of carbon thin film on glass substrate using material target from battery carbon rods with plasma sputtering show that the carbon was successfully deposited onto glass substrate. It was proved by FTIR results, C-C and C=C was formed [1]. In the view of all these, argon plasma sputtering to deposition carbon thin film using material target from battery carbon rods may provide a new efficient approach to improve the mechanical properties of films.…”

Section: акумуляторнI вIдходи -це вIдходи якI можуть завдати шкоди нmentioning

confidence: 94%

“…The atom of the target material that comes out is called a sputtered atom [10]. Sputtered atom will be deposited on surface substrate and thin films structure that is formed will affect to the hardness of substrate [1].…”

Section: Literature Review and Problem Statementmentioning

confidence: 99%

“…But the increase in the amount of battery waste is not balance with recycle processing of battery waste. Even though, carbon rod from waste of Zinc-Carbon battery contains Aluminum (Al) and Iron (Fe) which are harmful to human health and the environment [1][2][3]. Actually in modern batteries don't use Pb and Hg already in water.…”

Section: Introductionmentioning

confidence: 99%

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The effect of LFG plasma sputtering power on hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

Purkuncoro

Soenoko

Santjojo

et al. 2020

EEJET

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Section: Discussion Of the Research Results Of Hardness Value Of Carbmentioning

confidence: 93%

Section: Discussion Of the Research Results Of Hardness Value Of Carbmentioning

confidence: 99%

Section: акумуляторнI вIдходи -це вIдходи якI можуть завдати шкоди нmentioning

confidence: 94%

Section: Literature Review and Problem Statementmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

The effect of LFG plasma sputtering power on hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

Purkuncoro

Soenoko

Santjojo

et al. 2020

EEJET

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Effect of target-substrate distance on thickness and hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

Purkuncoro

Soenoko

Santjojo

et al. 2021

EEJET

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Carbon thin films on SKD11 steel were deposited by 40 kHz frequency plasma sputtering technique using a waste of battery carbon rods in argon plasma, and their mechanical properties were investigated by various target-substrate distances (1 cm, 1.7 cm, 2 cm, and 2.4 cm). The power used is 340 watts, the vacuum time is 90 minutes, and the gas flow rate is 80 ml/minute. The deposition time of carbon in plasma sputtering is 120 minutes with the initial temperature (temperature during vacuum) of 28 oC and the final temperature (the temperature after plasma sputtering) is 300 oC. The hardness value of SKD11 steel deposited with carbon thin films on SKD11 with target-substrate distance was tested using the Vickers microhardness test. Testing the thickness of the carbon thin films on the SKD11 steel substrate was carried out using a Nikon type 59520 optical microscope. Qualitative analysis of the thickness of the carbon thin films on the SKD11 steel substrate at a scale of 20 μm is shown by an optical microscope. Qualitatively, the thin film at a distance of 1.7 cm looks the brightest and thickest than other distance variations. Based on the Vickers microhardness test and Nikon type 59520 optical microscope, at the distance of 1 cm to 1.7 cm, the average thickness and hardness increased from 10,724 μm (286.6 HV) to 13,332 μm (335.9 HV). Furthermore, at the variation of the distance from 1.7 cm to 2.4 cm, the average thickness and hardness continued to decrease from 13.332 μm (335.9 HV) to 7.257 μm (257.3 HV). The possibility of interrupting atoms colliding with argon atoms in inert conditions increases at a long distance, thus causing the deposition flux on the SKD11 steel substrate to decrease

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Argon Flow Rate Effect on Hardness of Carbon Thin Films on SKD11 Steel Using Target Material from Battery Carbon Rods with Plasma Sputtering Method

Purkuncoro¹,

Soenoko²,

Herry³

et al. 2020

Journal of Southwest Jiaotong University

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Processes for increasing the hardness value of steel are among the most challenging in industrial applications. SKD11 steel is one of the steels that is commonly used in industry (building, transportation facility construction, and production of various kinds of scissors such as knife-edge mold, scissors, circular saw blades, and metal stamping mold). However, SKD11 steel has a hardness value of only around 58–60 HV. Even though it is often used for building and transportation facility construction, which requires material with a high hardness performance. It will be better if the hardness performance is increased. The deposition of carbon thin films with plasma sputtering is a physical vapor deposition method that is effective for improving the hardness value of material. The purpose of this study is to obtain the maximum average hardness value of carbon thin films on SKD11 through the optimization of the argon gas flow rate parameter on plasma sputtering. The effect of the argon gas flow rate parameter on the hardness value of carbon thin films for SKD11 steel is investigated using a Vickers hardness tester. The research method involves the use of target material from battery waste (carbon rods) using argon gas low-frequency plasma sputtering with variations in the argon gas flow rate of 20, 40, 60, 80, and 100 mL/min for 2 hours at 300˚C. The method allows for the improvement of the hardness performance of carbon thin films because the argon gas flow rate affects the probability of carbon atom collision with particles in the chamber and the number of argon ions formed. This can cause different structures and hardness values of thin films. Based on the results, it can be concluded that the optimum argon gas flow rate parameter is 80 mL/min, which is associated with the highest average hardness value of 335.9 HV.

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Deposition of Carbon Thin Film by Means of a Low-Frequency Plasma Sputtering Using Battery Carbon Rods as a Target

Cited by 3 publications

References 7 publications

The effect of LFG plasma sputtering power on hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

The effect of LFG plasma sputtering power on hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

Effect of target-substrate distance on thickness and hardness of carbon thin films on SKD11 steel using target material from battery carbon rods

Argon Flow Rate Effect on Hardness of Carbon Thin Films on SKD11 Steel Using Target Material from Battery Carbon Rods with Plasma Sputtering Method

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