2013
DOI: 10.1364/ol.38.001470
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Demonstration of high-Q mid-infrared chalcogenide glass-on-silicon resonators

Abstract: We demonstrated high-index-contrast, waveguide-coupled As2Se3 chalcogenide glass resonators monolithically integrated on silicon fabricated using optical lithography and a lift-off process. The resonators exhibited a high intrinsic quality factor of 2×10(5) at 5.2 μm wavelength, which is among the highest values reported in on-chip mid-infrared (mid-IR) photonic devices. The resonator can serve as a key building block for mid-IR planar photonic circuits.

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Cited by 91 publications
(57 citation statements)
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“…(I, J) Ge-on-Si [15] (© 2015 IEEE): (I) a mid-IR Ge-on-Si ridge waveguide; (J) TEM cross-sectional image of the Ge-on-Si film showing that the dislocations are confined at the Si/Ge interface. (K, L) Chalcogenide glass-on-silicon [16] (© 2013 Optical Society of America): (K) top-view optical micrograph of a ChG micro-disk resonator, (L) cross-sectional structure and simulated whispering gallery mode profile in the micro-disk at 5.2-μm wavelength; the high-index As 2 Se 3 glass forms the core layer surrounded by low-index Ge 23 Sb 7 S 70 glass cladding.…”
Section: Waveguides and Passive Devicesmentioning
confidence: 99%
See 1 more Smart Citation
“…(I, J) Ge-on-Si [15] (© 2015 IEEE): (I) a mid-IR Ge-on-Si ridge waveguide; (J) TEM cross-sectional image of the Ge-on-Si film showing that the dislocations are confined at the Si/Ge interface. (K, L) Chalcogenide glass-on-silicon [16] (© 2013 Optical Society of America): (K) top-view optical micrograph of a ChG micro-disk resonator, (L) cross-sectional structure and simulated whispering gallery mode profile in the micro-disk at 5.2-μm wavelength; the high-index As 2 Se 3 glass forms the core layer surrounded by low-index Ge 23 Sb 7 S 70 glass cladding.…”
Section: Waveguides and Passive Devicesmentioning
confidence: 99%
“…The recently demonstrated suspended Ge membrane devices hold the potential to fully utilize the broad transparency band of Ge, although optical functions of these devices at >3-μm wavelength are yet to be realized [29,30]. Infrared-transparent chalcogenides and halides, on the other hand, can be monolithically deposited on Si or dielectric substrates via thermal evaporation or sputtering, with waveguides defined by using two compositions of different indices as core and cladding layers ( Figure 3K-L) [16,[31][32][33][34][35][36][37][38]. Compared to Si or Ge, the drawback of this approach is that chalcogenides and halides are generally not considered compatible with CMOS foundry processes.…”
Section: Waveguides and Passive Devicesmentioning
confidence: 99%
“…In this paper, we present mid-IR photonic integration based on chalcogenide materials as well as sensing applications of the chip-scale mid-IR photonic platform. ChG mid-IR waveguide-coupled resonator fabrication [77], although the process is generic and can be equally implemented to other ChG on-chip device processing. The devices were fabricated on (100) silicon wafers topped with 300 nm thermal oxide as the starting substrate.…”
Section: Integrated Photonics For Infrared Spectroscopic Sensingmentioning
confidence: 99%
“…Nevertheless, the early absorption of the buried oxide around of λ = 3.6 µm limits its operation to the lowest spectral region of the mid-IR band. Other platforms such as silicon-on-sapphire (SOS) or silicon-on-silicon nitride (SON) were able to extend the cut-off wavelength up to 6 µm [5,6], whereas silicon-on-porous silicon (SiPSi), suspended silicon schemes, or the implementation of hybrid approaches permitted the Si transparency window to be fully exploited until 8 µm [7,8]. Alternatively, the use of Ge-on-Si platforms for mid-IR integrated photonics allowed the wavelength range to be further extended up to 14…”
Section: Introductionmentioning
confidence: 99%