2003
DOI: 10.1016/j.physb.2003.09.071
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Deep hole traps in Be-doped Al0.2Ga0.8As layers grown by molecular beam epitaxy

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Cited by 3 publications
(5 citation statements)
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“…The energy of trap H B3 (0.305 ± 0.006 eV) is comparable to the activation energy of trap H 3 (0.30 eV) [ 12 ], but H B3 found in this study shows an enhancement of the emission rate with the junction electric field. Therefore, it is difficult to confirm that this trap has the same nature.…”
Section: Resultssupporting
confidence: 81%
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“…The energy of trap H B3 (0.305 ± 0.006 eV) is comparable to the activation energy of trap H 3 (0.30 eV) [ 12 ], but H B3 found in this study shows an enhancement of the emission rate with the junction electric field. Therefore, it is difficult to confirm that this trap has the same nature.…”
Section: Resultssupporting
confidence: 81%
“…The nature of the traps before and after the emission can be summarised as C 0 → C - + C + , where C 0 is the charge state of the defect when it is filled, C - is defect charge state when it emits a hole, and C + is the carrier (hole in this case) that is emitted by the trap. Following this argument we are confident to confirm that hole traps found in this study H A1 , H A2 , H B1 , H B3 , H C1 , H C12 and H D1 are acceptor like traps [ 11 , 12 ].…”
Section: Resultssupporting
confidence: 76%
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“…Having a doped emitter can lead to excess noise owing to traps formed by ionized clustering of impurities, 9 and this can reduce the gain of optoelectronic devices. This G-R noise has the general property that the noise spectral density increases at lower frequencies and so low-frequency noise (LFN) measurement can be utilized as a diagnostic tool to characterize devices 10 .…”
Section: Grown By Molecular Beam Epitaxy (Mbe)mentioning
confidence: 99%