The carrier localization phenomenon has been investigated for GaBiAs by photomodulated transmittance (PT) and photoluminescence (PL). In the case of PT measurements, a decrease in the energy-gap related PT signal has been clearly observed below 180 K. In PL spectra a broad emission band very sensitive to the excitation power has been found. In comparison to the energy-gap related transition, this band is shifted to red. The recombination time for this band at low temperature decreases from 0.7 to 0.35 ns with the increase in the emission energy. All the findings are clear evidences for strong carrier localization in this alloy.

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Deep level transient spectroscopy in plasma-assisted molecular beam epitaxy grown Al 0.2 Ga 0.8 N / GaN interface and the rapid thermal annealing effect Dilute nitride GaAs 1-x N x layers have been grown by molecular beam epitaxy with nitrogen concentration ranging from 0.2% to 0.8%. These samples have been studied before and after hydrogen irradiation by using standard deep level transient spectroscopy (DLTS) and high resolution Laplace DLTS techniques. The activation energy, capture cross section and density of the electron traps have been estimated and compared with results obtained in N-free as-grown and H-irradiated bulk GaAs.

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