1999
DOI: 10.1088/0960-1317/9/2/006
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Decreasing the optical path length in an optoelectronic module using silicon micromachining

Abstract: In order to decrease the optical path length of an optoelectronic module, two ways of achieving 45 • silicon mirrors with trenches defining the mirror size are presented: dicing, and dry etching. The dicing was performed with a Disco DAD 361 dicing machine. To define the dry etched trench UV-lithography on electrodeposited resist was used. The electrodeposition was performed using commercially available positive photoresist PEPR 2400 from Shipley Ltd.

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Cited by 2 publications
(4 citation statements)
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References 6 publications
(7 reference statements)
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“…Note that existing photolithography cannot pattern the Ni catalyst at regions underneath the suspended microstructures [12][13][14][15][17][18][19][20][21][22][23][24][25][26]. In short, this study successfully employs the shadow mask as well as the thin film The CNTs grown in the present processes were characterized using field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM) and Raman spectroscopy.…”
Section: Resultsmentioning
confidence: 99%
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“…Note that existing photolithography cannot pattern the Ni catalyst at regions underneath the suspended microstructures [12][13][14][15][17][18][19][20][21][22][23][24][25][26]. In short, this study successfully employs the shadow mask as well as the thin film The CNTs grown in the present processes were characterized using field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM) and Raman spectroscopy.…”
Section: Resultsmentioning
confidence: 99%
“…The enlarged SEM micrograph in figure 3(d) clearly shows the CNTs at the edge of near 90 • sidewall. It is very challenging to deposit the Ni catalyst and then to grow the CNTs on the highly structured substrate surface with 90 • sidewalls using existing approaches [12][13][14][15][17][18][19][20][21][22][23][24][25][26].…”
Section: Resultsmentioning
confidence: 99%
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“…Taking into account that single mode fiber was used with NA = 0.12, which corresponds to a total dispersion of 13.78 • of beam output, the additional increase is attributed to scattering caused by surface waviness and microroughness. Scattering angle could be reduced further by reducing the optical path between the fiber and the mirror as proposed by Richard et al [16].…”
Section: Optical Characterization Of {1 1 0} Reflecting Mirror Planesmentioning
confidence: 99%