2012
DOI: 10.1109/lpt.2011.2177964
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Data Transmission and Thermo-Optic Tuning Performance of Dielectric-Loaded Plasmonic Structures Hetero-Integrated on a Silicon Chip

Abstract: International audienceWe demonstrate experimental evidence of the data capture and the low-energy thermo-optic tuning credentials of dielectric-loaded plasmonic structures integrated on a silicon chip. We show 7-nm thermo-optical tuning of a plasmonic racetrack-resonator with less than 3.3 mW required electrical power and verify error-free 10-Gb/s transmission through a 60-mu m-long dielectric-loaded plasmonic waveguide

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Cited by 27 publications
(23 citation statements)
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“…Nevertheless, the coexistence of silicon photonics and plasmonics on the same platform imposes proper formation of the SOI motherboard for efficient hetero-integration of the DLSPP waveguides [31]: By etching the SOI motherboard down to 200nm (Figure 2(a)), the formed recess in the 2μm-thick buried oxide (BOX) of the SOI substrate serves as the hosting region of a DLSPP waveguide. Towards selecting the dimensions of the DLSPP waveguides, it should be taken into account that the DLSPP waveguide characteristics, i.e., the mode field confinement, effective index and propagation length, are strongly influenced by the width and height of the employed dielectric ridge [29] as a result of the SPP field confinement that occurs when this ridge is placed on top of a metal film.…”
Section: Silicon and Dlspp Waveguidesmentioning
confidence: 99%
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“…Nevertheless, the coexistence of silicon photonics and plasmonics on the same platform imposes proper formation of the SOI motherboard for efficient hetero-integration of the DLSPP waveguides [31]: By etching the SOI motherboard down to 200nm (Figure 2(a)), the formed recess in the 2μm-thick buried oxide (BOX) of the SOI substrate serves as the hosting region of a DLSPP waveguide. Towards selecting the dimensions of the DLSPP waveguides, it should be taken into account that the DLSPP waveguide characteristics, i.e., the mode field confinement, effective index and propagation length, are strongly influenced by the width and height of the employed dielectric ridge [29] as a result of the SPP field confinement that occurs when this ridge is placed on top of a metal film.…”
Section: Silicon and Dlspp Waveguidesmentioning
confidence: 99%
“…Towards finalizing the design specifications, various parameters should be examined, i.e., the Si waveguide's width, the vertical offset between the two types of waveguides, the existence of a longitudinal gap in the metallic stripe as usually exists in fabricated structures, so as to optimize the matching of the optical modes during transition [37]. The validity of the simulation outcomes is achieved by their comparison with cut-back measurements for a variety of fabricated all Si and hybrid Si-DLSPP waveguide samples [31], [37]. As a result, a coupling loss per interface variance with a mean value of -2.5dB is feasible for 175nm-wide Si waveguides with 200nm vertical offset and DLSPP waveguides with 0.5μm metal gap.…”
Section: Silicon and Dlspp Waveguidesmentioning
confidence: 99%
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