1970
DOI: 10.1002/ange.19700820502
|View full text |Cite
|
Sign up to set email alerts
|

Das chemische Verhalten von aktivem Stickstoff

Abstract: Aktiver Stickstof entsteht durch elektrische Entladung in stromendem Stickstoff und gibt sich durch das charakteristische gelbe Nachleuchten zu erkennen. Zum quantitativen Nachweis eignet sich z. B. die Umsetzung mit Stickstoffoxid (,,Gasphasen-Titration"). Der aktive Stickstof setzt sich mit zahlreichen Elementen sowie anorganischen und organischen Verbindungen um. Seine wichtigsten Reaktionen sind auf Stickstoffatome zuriickzufiihren; daneben sind aber auch elektronisch angeregte Molekiile beteiligt.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
8
0
1

Year Published

1977
1977
2013
2013

Publication Types

Select...
4
4

Relationship

0
8

Authors

Journals

citations
Cited by 14 publications
(9 citation statements)
references
References 208 publications
0
8
0
1
Order By: Relevance
“…In 1911, Strutt (later Lord Rayleigh) coined the term active nitrogen 3e in order to describe “a chemically active modification of nitrogen, produced by the electric discharge” with a specific yellow long-lived afterglow, also known as Lewis−Rayleigh afterglow. In the following years, the meaning of the term active nitrogen was extended to include any excited form of nitrogen, molecular or atomic, of sufficient lifetime so that its chemical and physical properties can be studied …”
mentioning
confidence: 99%
“…In 1911, Strutt (later Lord Rayleigh) coined the term active nitrogen 3e in order to describe “a chemically active modification of nitrogen, produced by the electric discharge” with a specific yellow long-lived afterglow, also known as Lewis−Rayleigh afterglow. In the following years, the meaning of the term active nitrogen was extended to include any excited form of nitrogen, molecular or atomic, of sufficient lifetime so that its chemical and physical properties can be studied …”
mentioning
confidence: 99%
“…9 k 0 . 4 ~ lo-'' (4) < 5x (*)1.5 i -0.4 x lo-'' (3) 7 k 6 x 1 0-l6 (315 (*)3.3 I ~I 1.0 x 10-12 (3) 7.3 4 1.9 x 10-14 (3) G 1.7 x 10-16(22…”
mentioning
confidence: 99%
“…35 The results of the following investigations of the physical properties and chemical reactivity of active nitrogen towards various organic and inorganic substances were summarized in several reviews and books in the 1950-1970s. [36][37][38][39] At about the same time film deposition techniques were developed, driven by the needs of the microelectronic manufacturing among others. Deposition of silicon nitride as refractory, passivating, and insulating coatings could be carried out already at temperatures as low as 200 • C starting from silane and ammonia when supported by plasma activation.…”
Section: Nitrogen Plasmamentioning
confidence: 99%