Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures, Russian Academy of Sciences

Akhsakhalyan, A. D.; Kluenkov, E. B.; Lopatin, A. Ya.; Luchin, V. I.; Nechay, A. N.; Pestov, A. E.; Полковников, В. Н.; Салащенко, Н. Н.; Свечников, М. В.; Toropov, M. N.; Tsybin, N. N.; Чхало, Н. И.; Shcherbakov, A. V.

doi:10.1134/s1027451017010049

Cited by 45 publications

(10 citation statements)

References 88 publications

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“…The roughness of the substrates and the surface of the samples was measured using a Solver-Pro atomic force microscope. Information on the setups used, sputtering conditions and experimental methods can be found elsewhere (Akhsakhalyan et al, 2017).…”

Section: Methodsmentioning

confidence: 99%

“…High-precision aspherical MLMs are the basis for lithographic facilities that provide the most advanced technological standards for the production of chips (AnandTech https://www.anandtech.com/show/14695/samsungs-aggressiveeuv-plans-6nm-production-in-h2-5nm-4nm-on-track) and telescopes for diagnostics of the solar corona (Golub et al, 1990;Pesnell et al, 2012). Recently, MLMs have also been actively used for X-ray microscopy (Akhsakhalyan et al, 2017;Fogelqvist et al, 2017).…”

Section: Introductionmentioning

confidence: 99%

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Intrinsic roughness and interfaces of Cr/Be multilayers

Плешков¹,

Чхало²,

Полковников³

et al. 2021

J Appl Crystallogr

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The structures of Cr/Be multilayer mirror interfaces are investigated using X-ray reflectometry, diffuse X-ray scattering and atomic force microscopy. The combination of these methods makes it possible to separate the contributions of roughness and interlayer diffusion/intermixing for each sample. In the range of period thicknesses of 2.26–0.8 nm, it is found that the growth roughness of the Cr/Be multilayer mirrors does not depend on the period thickness and is ∼0.2 nm. The separation of roughness and diffuseness allows estimation of layer material intermixing and the resulting drop in the optical contrast, which is from 0.85 to 0.17 in comparison with an ideally sharp structure.

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Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Intrinsic roughness and interfaces of Cr/Be multilayers

Плешков¹,

Чхало²,

Полковников³

et al. 2021

J Appl Crystallogr

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“…Применение суперрешеток позволяет повысить эффективность отражающей оптики и снизить влияние рассеянного излучения. Важной задачей метрологического обеспечения при использовании синхротронного излучения является создание высокостабильных стандартных образцов состава и свойств материалов, эффективных многослойных покрытий для фильтров, приемников и зеркал, используемых в области экстремального ультрафиолета [1][2][3].…”

Section: Research Articleunclassified

Metrological studies of the characteristics of multilayer surface coatings using synchrotron radiation

Сигов

Minaeva

Anevskii

et al. 2021

Rossijskij tehnologičeskij žurnal

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The investigations of multilayer surface nanostructures characteristics was performed with synchrotron radiation sources, characterized by an intensive, calculated continuum. It plays an important role in nanoelectronics metrological base. The main research were carried out at electron storage rings «Siberia-1» (Kurchatov Institute) and MLS (PTB, Berlin) with low electron energy, in a wide wavelength range, including visible range, AUV, VU, EUV and to exclude the X-ray radiation influence. The methods of the radiometers, photodiodes, filters and multilayer mirrors characteristics measurements are based on the synchrotron radiation absolute spectral characteristics and accelerated electrons number variation. The metrological investigations with synchrotron radiation was concentrated on: – absolute spectral responsivety of silicon photodiodes with multilayer filters for integral radiometers applications; – spectral transmittances of surface layers of photodiodes in the extreme ultraviolet region; – spectral reflectance coefficient of superlattice. The characteristics of photodiodes and filters on a synchrotron radiation source are measured using a monochromator and a reference detector. The use of a synchrotron radiation channel makes it possible to study the spectral transmittance of thin films and multilayer structures formed in the in situ mode. To form multilayer nanostructures directly on the receiving surface of photodetectors, an ion-plasma sputtering module is used. The optical scheme of the channel provides for the possibility of using monochromators of grazing incidence for the range of photon energies from 25 to 100 ev and normal incidence for the range of photon energies from 4 to 25 ev. At a photon energy of 40 ev, the absolute spectral sensitivity was 70 ma / W for a photodiode with a surface multilayer filter applied. To develop an experimental technique for measuring the spectral reflection coefficient of multilayer mirrors, and to create standard samples, the Mo/Si system was studied. Computer modeling of multi-layer coatings allows us to calculate the optical characteristics of superlattices in the extreme ultraviolet region. The obtained results of measurements of the spectral reflection coefficient of a multilayer coating in the photon energy range of 65–100 ev indicate a resonance reflection character with a max-imum at an energy of 83.5 ev and an energy width at a half-height of about 6.5 ev. The working wave-length of the reflecting mirror corresponds to the calculated one, which confirms the effectiveness of the adopted model.

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“…X-ray optics is one of the key technologies in various scientific, engineering, and industrial applications. This technology has attracted intensive attention worldwide due to its importance [1][2][3][4]. Developing a local technological chain to design and manufacture high-reflective X-ray optical components is crucial for national economics and security.…”

Section: Introductionmentioning

confidence: 99%

Multilayer Reflective Coatings for BEUV Lithography: A Review

Uzoma

Salman

et al. 2021

Nanomaterials

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The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet to the extreme ultraviolet radiation. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Because a BEUV lithographical system contains at least 10 mirrors, the optics’ reflectivity becomes a crucial point. The increasing of a single mirror’s reflectivity by 10% will increase the system’s overall throughput six-fold. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings.

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Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures, Russian Academy of Sciences

Cited by 45 publications

References 88 publications

Intrinsic roughness and interfaces of Cr/Be multilayers

Intrinsic roughness and interfaces of Cr/Be multilayers

Metrological studies of the characteristics of multilayer surface coatings using synchrotron radiation

Multilayer Reflective Coatings for BEUV Lithography: A Review

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