2016
DOI: 10.1002/pssr.201600157
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Current and efficiency improvement for a GaAsP/SiGe on Si tandem solar cell device achieved by light trapping techniques

Abstract: A GaAsP/SiGe tandem solar cell on Si substrate has been further fabricated using light trapping techniques, such as texturing and adding a back surface reflector, and thinning the Si substrate. This is of importance to increase the Jsc of the Si0.18Ge0.82 bottom cell in this tandem system since bottom cell is current limiting. The Jsc of the bottom cell has been increased by relative 7.4%. This current improvement leads to a predicted efficiency of near 21% for this tandem device, with an absolute efficiency i… Show more

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Cited by 7 publications
(6 citation statements)
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“…We observe that the absorption range of the proposed structure varies from 225 to 900nm with the amplitude of EQE =90%. These results were validated by two other measured results from refs [27] and [28].We notice that the absorption range obtained by [27,28] varies from 300 to 778 nm. The absorption range of our structure is larger than the absorption range found by refs [27,28].…”
Section: Resultssupporting
confidence: 89%
See 2 more Smart Citations
“…We observe that the absorption range of the proposed structure varies from 225 to 900nm with the amplitude of EQE =90%. These results were validated by two other measured results from refs [27] and [28].We notice that the absorption range obtained by [27,28] varies from 300 to 778 nm. The absorption range of our structure is larger than the absorption range found by refs [27,28].…”
Section: Resultssupporting
confidence: 89%
“…These results were validated by two other measured results from refs [27] and [28].We notice that the absorption range obtained by [27,28] varies from 300 to 778 nm. The absorption range of our structure is larger than the absorption range found by refs [27,28]. So we got a relative absorption gain of 29.12%.…”
Section: Resultssupporting
confidence: 89%
See 1 more Smart Citation
“…The front III−V side was protected by photoresist and Apiezon wax to prevent any chemical damage during the texturing. 21 The application of photoresist protection between the wax and III−V is imperative to preventing any potential residues caused by the pronounced volatility of toluene, which was used in the wax removal process. As a passivation layer, a 5 nm Al 2 O 3 / 100 nm SiO 2 stack was deposited on the textured Si back surface via atomic layer deposition and plasma-enhanced chemical vapor deposition (PECVD), respectively.…”
Section: Si Cell Fabricationmentioning
confidence: 99%
“…However, such ARCs often require high temperature vacuum processes adding significant manufacturing and deployment costs. Various nanoscale surface patterning techniques have been suggested as lower cost methods to improve light absorption within active material of solar cells due to light trapping schemes . However, such approaches may lead to negative impacts on solar cells' performance as they can increase surface recombination and decrease the open circuit voltage.…”
Section: Introductionmentioning
confidence: 99%