2019
DOI: 10.1063/1.5098806
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Crystal orientation effects of sapphire substrate on graphene direct growth by metal catalyst-free low-pressure CVD

Abstract: Graphene was directly grown on r-plane (1-102), c-plane (0001), and a-plane (11-20) sapphires by low pressure chemical vapor deposition without the use of a metal catalyst. The growth temperature was systematically changed between 1090 and 1210 °C to investigate the effects of the crystal orientation of sapphire on the graphene growth. It was found that the growth rate of graphene on r-plane sapphire was very fast compared to that of the samples grown on other orientations. The surface catalytic effect of r-pl… Show more

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Cited by 14 publications
(27 citation statements)
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“…Recently, we reported that graphene direct CVD on r-plane (1–102) sapphire grew very fast and offered a quite uniform layer compared to that of conventional growth on c-plane sapphire. , However, there are many unknown parts in the mechanism of graphene direct growth on sapphire. On the other hand, a-plane (11–20) sapphire is sometimes used as a substrate for epitaxial growth of nitrides or oxides, as well as c-plane and r-plane sapphires. In addition, a-plane sapphire has attracted attention as a low-cost substrate for nitride semiconductor-based devices because an 8 in.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, we reported that graphene direct CVD on r-plane (1–102) sapphire grew very fast and offered a quite uniform layer compared to that of conventional growth on c-plane sapphire. , However, there are many unknown parts in the mechanism of graphene direct growth on sapphire. On the other hand, a-plane (11–20) sapphire is sometimes used as a substrate for epitaxial growth of nitrides or oxides, as well as c-plane and r-plane sapphires. In addition, a-plane sapphire has attracted attention as a low-cost substrate for nitride semiconductor-based devices because an 8 in.…”
Section: Introductionmentioning
confidence: 99%
“…Typically, c‐plane, r‐plane and a‐plane sapphire have been employed. It is generally believed that r‐plane enables better quality and faster growth rate for graphene growth, which could be attributed to the advanced catalytic capability of r‐plane, as claimed by previous reports [11c,d] . Nevertheless, it is worth noting that the statement on “catalytic capability” indeed lack of theoretical proof and experimental verification in a systematic way.…”
Section: Direct Growth Of Graphene Over Sapphirementioning
confidence: 88%
“…Ueda et al . also carried out an investigation by probing the growth on r‐plane, c‐plane and a‐plane sapphire surfaces under low pressure using different temperatures [11d] . Similarly, it was found that the r‐plane featured favorable catalytic activity with respect to c‐plane and a‐plane.…”
Section: Direct Growth Of Graphene Over Sapphirementioning
confidence: 95%
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“…Al 2 O 3 substrate has been used for the direct growth of graphene due to its insulating properties, lower adhesion energy to graphene, and high reusability. [ 176–180 ] Hwang and co‐workers reported the CVD growth of epitaxial graphite films on single‐crystal Al 2 O 3 (0001) substrate using propane as the carbon source at a growth temperature up to 1650 °C. [ 181 ] However, the film was not uniform with the thinnest region of nine layers.…”
Section: Growth On Single‐crystal Semiconducting and Dielectric Substratesmentioning
confidence: 99%