Coupled effects of deposition and annealing temperatures on optical, electrical and mechanical properties of titanium oxide thin films

Miller, Mark J.; Wang, Junlan

doi:10.1016/j.vacuum.2015.07.005

Cited by 13 publications

(1 citation statement)

References 33 publications

(30 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Thin oxide films can be prepared by various methods, such as chemical vapor deposition, electron beam evaporation, direct current or radio frequency magnetron sputtering, arc deposition, atomic layer deposition, and sol-gel [1][2][3][4]. Thin films prepared in physical vapor deposition (PVD) processes exhibit numerous advantages over coatings deposited by other aforementioned methods, that is, they have controlled homogeneity and thickness over a large area [5,6].…”

Section: Introductionmentioning

confidence: 99%

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

et al. 2018

View full text Add to dashboard Cite

In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films.

show abstract