Correlation of Optical Properties and Laser Damage Resistance for Ion Beam Sputtered Al2O3/AlF3 and Al2O3/SiO2 Mixture Coatings

Mende, Mathias; Balasa, Istvan; Ehlers, Henrik; Ristau, Detlev; Douti, Dam-Bé; Gallais, Laurent; Commandré, Mireille

doi:10.1364/oic.2013.fa.5

Cited by 2 publications

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“…The mixture coatings were fabricated in an ion beam sputtering process, applying a zone target assembly. A more detailed description of the coating plants and some aspects of the deposition process are published in [6,9,12,17]. Results obtained on metallic films (Ag, Pt) [10] are also reported.…”

Section: A Samplesmentioning

confidence: 99%

“…All coatings were deposited on fused silica substrates, except AlF 3 -Al 2 O 3 samples that were deposited on MgF 2 substrates [12] and metallic films that were deposited on polymers. Some experiments were conducted on coatings deposited on substrates with different polishing grades and no distinguishable difference in the intrinsic LIDT between samples deposited on the substrates with the different polishing qualities were found (Ref.…”

Section: A Samplesmentioning

confidence: 99%

“…Therefore, the objective of the present paper is to report on an extensive study of optical materials in bulk and thin film forms that have been characterized and damage-tested in similar conditions. A large part of the results in the case of coatings has been reported in different published works from our group [5][6][7][8][9][10][11][12]; however, the interest of the present paper is to compare and discuss all these experimental results on the same basis, using scaling laws that will be described. Additionally, these data have been completed with other coating and bulk materials (see Tables 1, 2, and 3).…”

Section: Introductionmentioning

confidence: 99%

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Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

2013

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We report on extensive femtosecond laser damage threshold measurements of optical materials in both bulk and thin-film form. This study, which is based on published and new data, involved simple oxide and fluoride films, composite films made from a mixture of two dielectric materials, metallic films, and the surfaces of various bulk materials: oxides, fluorides, semiconductors, and ionic crystals. The samples were tested in comparable conditions at 1030 nm, 375 to 600 fs, under single-pulse irradiation. A large number of different samples prepared by different deposition techniques have been tested, involving classical materials used in the fabrication of optical thin film components (Ag, AlF3, Al2O3, HfO2, MgF2, Nb2O5, Pt, Sc2O3, SiO2, Ta2O5, Y2O3, and ZrO2) and their combination with codeposition processes. Their behaviors are compared with the surfaces of bulk materials (Al2O3, BaF2, CaF2, Ge, KBr, LiF, MgF2, NaCl, Quartz, Si, ZnS, ZnSe, and different silica glasses). Tabulated values of results are presented and discussed.

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Section: A Samplesmentioning

confidence: 99%

Section: A Samplesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

2013

Self Cite

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“…Many properties of the films, such as the refractive index, Electric field intensity distribution, absorption coefficients, and defect density and so on, have been subject of various publications [1][2][3][4] .…”

Section: Introductionmentioning

confidence: 99%

Laser damage properties of films with different surface accuracy of substrates

2014

SPIE Proceedings

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The analysis of laser damage properties of films is the focus of most concern in recent years. Many properties of the film have been studied, but the surface accuracy of the substrates shouldn't be ignored. TiO 2 films are prepared on K9 glass substrates with different surface accuracy by ion beam assistant deposition technique. The films' surface morphology, microstructure and thickness are been analyzed. It shows that the substrates with different surface accuracy have some impact on thin film growth and make different micro-structures of thin film. According to the international standard requirements of the damage threshold, the films' damage threshold is measured on the films' laser-induced damage threshold test platform composed with 1064 nm Nd: YAG laser. The results indicate that the laser damage threshold of the film deposited on the substrate with the better surface accuracy is higher, and the substrate with high accuracy can improve the laser damage resistance of the film.

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Correlation of Optical Properties and Laser Damage Resistance for Ion Beam Sputtered Al2O3/AlF3 and Al2O3/SiO2 Mixture Coatings

Cited by 2 publications

References 0 publications

Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

Laser-induced damage thresholds of bulk and coating optical materials at 1030 nm, 500 fs

Laser damage properties of films with different surface accuracy of substrates

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