Correlation of interfacial structure and microstress of yttrium-modified ion-plated titanium nitride film with its adhesion property

Characteristics and machining applications of Ti(Y)N coatings

“…In the initial stage of the process, yttrium atoms or ions are preferentially produced owing to the somewhat higher vapour pressure of yttrium at the temperature of the molten pool. These particles, which have a suitably high kinetic energy of 3/ 2KT [20], firstly bombard the substrate. Part of the kinetic energy is transferred into heat, so the bombarded micro-area may be heated to a temperature higher than the nominal deposition temperature.…”

“…Phase identification and examination of the texture of the coatings were performed by X-ray diffraction (XRD), under the conditions of V =30 kV, I =20 mA, and Cu Kα radiation. Internal stress of the films was measured by X-ray line profile analysis [20].…”

Adhesion, atomic structure, and bonding variation at TiN/VN interface by chemical segregation

“…In addition, Choi et al introduced Y into the TiN films (Ti 1‐ x Y x N) and also obtained enhanced micro‐hardness and adhesion strength. The Y‐doped TiN film shows better performance than pristine TiN film as well, which is ascribed to the barrier posed by the out‐diffusion Y to the in‐diffusion O . Recently, Zheng et al deposited Ti(Y)N coatings onto stainless steel and found that the coatings exhibit strong adhesion, good corrosion resistance, and long lifetime.…”