2017
DOI: 10.1063/1.4974366
|View full text |Cite
|
Sign up to set email alerts
|

Correlation between temperature dependence of Raman shifts and in-plane strains in an AlGaN/GaN stack

Abstract: The temperature dependence of Raman shifts for different layers and different optical phonon modes in an AlGaN/GaN stack was examined in this study. The slopes of the Raman shifts as a function of temperature for the GaN and Al x GaN layers were found to vary, especially for the E 2 high mode compared with that for the A 1 (LO) mode. To further investigate these fluctuations in the temperature dependence of Raman shifts, a detailed evaluation was conducted for the depth distribution of in-plane strains in the … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
11
0

Year Published

2019
2019
2023
2023

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 9 publications
(11 citation statements)
references
References 48 publications
0
11
0
Order By: Relevance
“…21 There was no phonon mode associated with the cubic phase of AlGaN and GaN, indicating that our samples had a hexagonal structure. Internal strain due to a latice mismatch causes the peak shifting, as revealed by Zardo et al 22 and Kosemura et al 23 The results indicate that the p-GaN/AlGaN/GaN heterostructure was grown epitaxially on the Si(111) substrate.…”
Section: Device Fabrication and Experimental Setupmentioning
confidence: 82%
See 1 more Smart Citation
“…21 There was no phonon mode associated with the cubic phase of AlGaN and GaN, indicating that our samples had a hexagonal structure. Internal strain due to a latice mismatch causes the peak shifting, as revealed by Zardo et al 22 and Kosemura et al 23 The results indicate that the p-GaN/AlGaN/GaN heterostructure was grown epitaxially on the Si(111) substrate.…”
Section: Device Fabrication and Experimental Setupmentioning
confidence: 82%
“…Internal strain due to a latice mismatch causes the peak shifting, as revealed by Zardo et al . and Kosemura et al The results indicate that the p-GaN/AlGaN/GaN heterostructure was grown epitaxially on the Si(111) substrate.…”
Section: Device Fabrication and Experimental Setupmentioning
confidence: 82%
“…The typical Raman peak of the Si substrate was observed at 521 cm −1 in the B-PD structure and the separated Si substrate, but it was not observed in the M-PD structure. In the B-PD structure, the Raman peaks 23 were measured at 521 cm −1 for the Si substrate, 570 cm −1 for the GaN layer, and 736 cm −1 for the Al 0.12 GaN layer, respectively, as shown in Figure 4a. After the lift-off process, the GaN and AlGaN Raman peaks were observed in the lift-off M-PD structure without the Si peak.…”
Section: Resultsmentioning
confidence: 99%
“…There were both AlN‐like peaks and GaN‐like peaks in the Raman spectra from AlGaN. [ 22,23 ] The energy of these two phonon modes is dependent on both the Al composition and the strain of the AlGaN layer. As shown in the published reports, [ 2,24 ] the Al composition dependency of AlN‐like E 2 (high) mode energy is about 0.20 cm −1 /(0.1x), where x is the Al composition in Al x Ga (1−x) N. This is much smaller than the Al composition dependency of the GaN‐like E 2 (high) mode of 6.8 cm −1 /(0.1x), while the Raman shift due to the strain variation in GaN‐LED structures is ~1 cm −1 .…”
Section: Resultsmentioning
confidence: 99%