2014
DOI: 10.1557/jmr.2013.388
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Copper oxide as a “self-cleaning” substrate for graphene growth

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Cited by 49 publications
(54 citation statements)
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“…[ 18,24 ] In addition, passivation of the active sites on copper foil prior to the graphene growth, such as oxygen exposure, is expected to enable graphene nucleation in a controllable manner. [ 12,16,27,28 ] These passivators could nevertheless react with the reducing agent (e.g., the reaction between oxygen and hydrogen) to cause the passivated sites to regain their catalytic ability for new nucleation.…”
Section: Doi: 101002/adma201600403mentioning
confidence: 99%
“…[ 18,24 ] In addition, passivation of the active sites on copper foil prior to the graphene growth, such as oxygen exposure, is expected to enable graphene nucleation in a controllable manner. [ 12,16,27,28 ] These passivators could nevertheless react with the reducing agent (e.g., the reaction between oxygen and hydrogen) to cause the passivated sites to regain their catalytic ability for new nucleation.…”
Section: Doi: 101002/adma201600403mentioning
confidence: 99%
“…24 Various cleaning strategies have been shown including annealing in air 25 . This leads to organic solvent molecules adhering to the Cu substrate surface.…”
Section: One-step Graphene Synthesis From Adsorbed Moleculesmentioning
confidence: 99%
“…Effects related to the presence of copper oxides on the substrates were recently discussed by Hao et al 24 to have a significant influence on the graphene nucleation mechanism. 25,26 The issue of carbon contaminants and its removal by plasma assisted methods was discussed by Kato et al 27 . However, such continuous plasma processes involving atomic hydrogen can alter the graphene structure itself and induce further structural changes and defects.…”
mentioning
confidence: 99%