2004
DOI: 10.1021/cm0344764
|View full text |Cite
|
Sign up to set email alerts
|

Controlled Growth of Long GaN Nanowires from Catalyst Patterns Fabricated by “Dip-Pen” Nanolithographic Techniques

Abstract: Long gallium nitride (GaN) nanowires were directly grown on SiO2 substrates from spatially defined locations using a chemical vapor deposition method. Locations of the GaN nanowires were well-controlled by using atomic force microscope (AFM)-based “dip-pen” nanolithography (DPN) and other patterning methods to precisely pattern catalyst islands on the substrate. Devices made of single GaN nanowires were fabricated and characterized. The convenient use of patterning techniques, especially the DPN technique, dem… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
60
0

Year Published

2005
2005
2015
2015

Publication Types

Select...
7
1

Relationship

1
7

Authors

Journals

citations
Cited by 62 publications
(60 citation statements)
references
References 25 publications
0
60
0
Order By: Relevance
“…16,18,19 The metal catalysts were patterned by lithography methods. In this way, the GaN nanorod growth is position controlled due to the lateral patterning of the metal catalyst.…”
Section: Self-organized Growth Of Gan Nanorodsmentioning
confidence: 99%
See 1 more Smart Citation
“…16,18,19 The metal catalysts were patterned by lithography methods. In this way, the GaN nanorod growth is position controlled due to the lateral patterning of the metal catalyst.…”
Section: Self-organized Growth Of Gan Nanorodsmentioning
confidence: 99%
“…However, the orientation and the number of GaN nanorods grown on one metal catalyst site needs to be further controlled. 16,19 Although GaN nanorods can be obtained via a VLS growth mode, nanorods often differ in their crystal orientations and in their tendency to tilt, twist, intersect, and branch during growth. Single GaN nanorod based LEDs fabricated by VLS growth were successfully demonstrated using focus ion beam etching for contact preparation.…”
Section: Self-organized Growth Of Gan Nanorodsmentioning
confidence: 99%
“…Positional control of GaN NW growth has been achieved by a dip-pen method. 16 Patterned growth of other nanostructures utilizing FIB was demonstrated using Ga + ion implanted substrates or Ga + I-beam milled masks. 17,18 Another alternative is positional control of NW growth by FIB-Pt patterning of nanoscale catalyst islands, or dots.…”
Section: Postprint Version Published In Applied Physicsmentioning
confidence: 99%
“…We introduced a new Ge 98 Dy 2 semiconductor nanowire material, and discussed its fabrication and influencing instruments on the nanoscale, considering possibilities to use similar highly doped Ge-based nanowires as room temperature magnetic semiconductors and magnetic nanodevices. The last aspect will complement partially achieved goals to orient a nanowire in a desired direction [7,14]. A single magnetic nanowire will be easily directed in a relatively small switchable magnetic field in an appropriate environment; analogously, a dielectric nanowire -in an electric field.…”
Section: Organization Of Matter In a Tube Reactormentioning
confidence: 92%
“…in the case of perpendicularly magnetized Co/Pt [4] or Fe/Pt [5] patterned surfaces, organized Fe 3 O 4 particles will add to the inherent magnetic properties of the substrate. In another instance, entrenched and organized nanowires in antidots [6] will lead to in-situ fabrication of nano-devices with targeted properties [7].…”
Section: Introductionmentioning
confidence: 99%