2021
DOI: 10.1016/j.mssp.2020.105631
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Controlled epitaxial growth of GaN nanostructures on sapphire (11–20) using laser molecular beam epitaxy for photodetector applications

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Cited by 16 publications
(19 citation statements)
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“…Alternatively, non-polar a-plane sapphire substrate was utilized to grow c-plane GaN. The main interest of the aforementioned substrate was due to the minimal lattice mismatch between c-plane GaN grown on a-plane sapphire substrate, leading to the production of nano-porous (NP)-and nano-column (NC)-GaN features on sapphire (1120) substrate [56].…”
Section: A-plane Sapphire Substratementioning
confidence: 99%
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“…Alternatively, non-polar a-plane sapphire substrate was utilized to grow c-plane GaN. The main interest of the aforementioned substrate was due to the minimal lattice mismatch between c-plane GaN grown on a-plane sapphire substrate, leading to the production of nano-porous (NP)-and nano-column (NC)-GaN features on sapphire (1120) substrate [56].…”
Section: A-plane Sapphire Substratementioning
confidence: 99%
“…The designs of the photodetectors were categorized into four types of geometry, namely, MSM semiconductor, p-n junction, p-i-n junction, and hybrid-type geometry, as shown in Figure 4 [1,[52][53][54]. Due to its straightforward process, MSM geometry has been considered a popular geometry choice, especially in UV photodetectors that are fabricated on epitaxial GaN nanostructures [56]. MSM UV photodetectors were fabricated by depositing platinum (Pt) metal electrodes with a separation of 200 μm on GaN film.…”
Section: Photodetector Geometry and Metal Contactsmentioning
confidence: 99%
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