2009
DOI: 10.1016/j.vacuum.2009.03.025
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Control of the bias voltage in d.c. PVD processes on insulator substrates

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Cited by 9 publications
(4 citation statements)
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“…Independently of the deposition process, substrate biasing assures energetic ion bombardment thus improving film properties [12,13] in accordance with the well-known structure zone diagram [4,14]. Commonly, the bias waveforms depend of the electrical properties of substrate, resulting in a DC bias voltage to be used for conductive substrates and an AAC bias in the case of insulating substrates in order to realize the ion bombardment control in a most efficient way.…”
Section: Introductionmentioning
confidence: 98%
“…Independently of the deposition process, substrate biasing assures energetic ion bombardment thus improving film properties [12,13] in accordance with the well-known structure zone diagram [4,14]. Commonly, the bias waveforms depend of the electrical properties of substrate, resulting in a DC bias voltage to be used for conductive substrates and an AAC bias in the case of insulating substrates in order to realize the ion bombardment control in a most efficient way.…”
Section: Introductionmentioning
confidence: 98%
“…Figure 7 shows the hardness profiles that were obtained in the different samples studied in this paper. Due to the non-conductive nature of the ceramic substrates, direct current (DC) biasing the samples is useless, since the substrate surface will not follow the applied bias voltage, which affects the growth of the coatings, leading to hardness values that are much lower than the reference values obtained on metallic substrates (18 GPa for CrN and 24 GPa for TiN) [25]. In addition, the measured hardness of the coatings decreased rapidly with the depth of indentation, being significantly affected by the relative softness of the substrate.…”
Section: Mechanical Propertiesmentioning
confidence: 99%
“…In fact, the disappearance of the interferometric features in the reflectance spectra occurs at the same annealing temperature where the Au crystallization starts to be detected. The relatively low values of the reflectivity at shorter wavelengths are characteristic of high free electron density systems (Yate et al, 2009). Increasing the annealing temperature, the films of group II and group III change their behaviour in comparison with the as deposited sample, from interference-like to intrinsiclike, as revealed by the surface colour tones that tend to a red-brownish colour, in comparison to the interferometric tones of the as-deposited and 200 ºC annealed samples (group I), figure 10.…”
Section: Optical Propertiesmentioning
confidence: 99%