2005
DOI: 10.1063/1.1928318
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Control of conduction type in Al- and N-codoped ZnO thin films

Abstract: p -type ZnO thin films have been fabricated by an Al- and N-codoping technique at the growth temperature between 380 and 480 °C, as identified by the Hall measurement. At lower and higher temperatures, however, the samples are n type. The best p-type sample shows a resistivity and hole concentration of 24.5 Ω cm and 7.48×1017cm−3 at room temperature, respectively. Spread resistance depth profile further shows the transition from n-type substrate to p-type ZnO through a clearly defined depletion region. Photolu… Show more

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Cited by 85 publications
(36 citation statements)
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“…The traditional co-doping approach 9 by doping donor and acceptor simultaneously is another way to enhance the solubility of a dopant in ZnO. There have been several publications reporting on successful fabrication of codoped p-type ZnO 5, [10][11][12][13][14][15][16] , as well as failures [17][18][19] . However, the high ionization energy of acceptors, caused by the very low valence band maximum (VBM) of ZnO, is hard to overcome 20 .…”
mentioning
confidence: 99%
“…The traditional co-doping approach 9 by doping donor and acceptor simultaneously is another way to enhance the solubility of a dopant in ZnO. There have been several publications reporting on successful fabrication of codoped p-type ZnO 5, [10][11][12][13][14][15][16] , as well as failures [17][18][19] . However, the high ionization energy of acceptors, caused by the very low valence band maximum (VBM) of ZnO, is hard to overcome 20 .…”
mentioning
confidence: 99%
“…
As an important II-VI semiconductor, ZnO has attracted increasing interests owing to its unique properties such as wide band-gap (3.37 eV) and large exciton binding energy (60 meV).[1] ZnO has shown great potential in optoelectronic devices such as light emitting diodes (LED) and laser diodes (LDs) operating in the short-wavelength or UV region.[2]Compared to their thin-film counterparts, [3][4] nanoscale devices assembled on free-standing nanowires [5][6][7][8][9][10] could enable new functions, high efficiency, enhanced performance, and diverse applications. [11][12][13][14][15][16][17][18][19][20] As in thin-film devices, the success of nanodevices similarly relies on the capability of controlling the transport and electrical properties of the selected materials.
…”
mentioning
confidence: 99%
“…Devices exhibited very good rectification ratio, substantially low leakage current and indicate formation of rectifying behavior between ZnO and n-type SiC with a noticeable superiority for 4HSiC substrates. These values are better than values previously reported, where more sophisticated and expensive techniques were used [6,9]. In Fig.3.b, ln J-V characteristics show doping nature effects on Schottky diodes.…”
Section: Accepted Manuscriptmentioning
confidence: 52%
“…A decade ago, Alivov et al [7,8] reported on the growth of ZnO/p-6HSiC heterostructures diodes by plasma-assisted molecular-beam epitaxy (MBE). In the same time, Yuen et al [9] demonstrated the possibility to fabricate ZnO: Al/p-4HSiC heterojunction light-emitting diodes (LEDs) by a filtered cathodic vacuum arc technique. More recently, Y.T.…”
Section: Introductionmentioning
confidence: 99%