1976
DOI: 10.1063/1.1134756
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Contactless measurement of semiconductor conductivity by radio frequency-free-carrier power absorption

Abstract: It is shown that, under suitable conditions, the power absorbed by a thin semiconductor slice in an oscillating magnetic field is accurately proportional to the material conductivity. The magnitude of this power absorption can be used to determine the conductivity by coupling the semiconductor to an amplitude-stabilized marginal oscillator and noting the power needed to maintain the demanded level of oscillation. Instruments of this type have been constructed exhibiting ∼1% linearity over a 100:1 range of samp… Show more

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Cited by 66 publications
(27 citation statements)
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“…For further details see also [5]. The sheet resistance of the samples is measured contactless by a Tencor Instruments m-gage 300 [6]. The sheet resistance mappings across the wafers showed an excellent uniformity with a deviation of less than 0.5 % for samples below 200 Ω , around 1 % for samples up to 2000 Ω , and less than 5 % for samples above 2000 Ω .…”
Section: Introductionmentioning
confidence: 99%
“…For further details see also [5]. The sheet resistance of the samples is measured contactless by a Tencor Instruments m-gage 300 [6]. The sheet resistance mappings across the wafers showed an excellent uniformity with a deviation of less than 0.5 % for samples below 200 Ω , around 1 % for samples up to 2000 Ω , and less than 5 % for samples above 2000 Ω .…”
Section: Introductionmentioning
confidence: 99%
“…This technique can again be used to create a resistivity map by moving the library beneath the measurement coil. 43,44 Electrical conductivity (s) is the inverse of r and is related to the concentrations of electrons (n e ) and holes (n p ) through their respective mobilities (m e and m p ) and by: s ¼ n e em e þ n p em p (6.5) where e is the magnitude of the electronic charge. The dominant or majority carrier type can be determined several different ways depending on the degree of electrical conductivity.…”
Section: Mapping Librariesmentioning
confidence: 99%
“…Recent advancements allow determination of iron densities as low as 10 8 cm -3 . The iron density is given by 9 [1] where L nf and L ni are the final and initial diffusion lengths in µm. As the iron density in Si wafers decreases to 10 9 cm -3 and below, it becomes more difficult to determine N Fe for several reasons.…”
Section: Minority Carrier Lifetime Defectsmentioning
confidence: 99%