2000
DOI: 10.1051/epjap:2000128
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Contactless mapping of lifetime and diffusion length scan map of minority carriers in silicon wafers

Abstract: The lifetime of minority carriers in crystalline silicon wafers is determined by means of the contactless microwave phase-shift technique, when the surfaces of the samples are passivated using an iodine aqueous solution of polyvidone. The stability of the passivation is sufficient in order to obtain a lifetime scan map with spatial resolution of 50 µm, using a thin coaxial cable which directs 9.4 GHz microwaves onto the investigated samples and a fiber coupled laser diode which generates carriers in excess. In… Show more

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Cited by 20 publications
(14 citation statements)
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“…This study is a preliminary study for the development of a characterization bench based on the microwave phaseshift technique (mW-PS) for the determination of impurities in silicon. mW-PS [36] is a sensitive (10 9 cm À3 limit [37]), contactless technique carried out at low level of carrier injection based on the measurement of the phaseshift between the modulated light excitation signal and the intensity of the reflected microwaves.…”
Section: Discussionmentioning
confidence: 99%
“…This study is a preliminary study for the development of a characterization bench based on the microwave phaseshift technique (mW-PS) for the determination of impurities in silicon. mW-PS [36] is a sensitive (10 9 cm À3 limit [37]), contactless technique carried out at low level of carrier injection based on the measurement of the phaseshift between the modulated light excitation signal and the intensity of the reflected microwaves.…”
Section: Discussionmentioning
confidence: 99%
“…Lifetime is also measured by the contact less microwave phase shift (µWPS) technique [6]. These measurements could be applied to the wafers before and after any type of treatment, including dissociation of FeB and CrB pairs, by annealing at 200…”
Section: Methodsmentioning
confidence: 99%
“…Glow discharge mass spectroscopy (GDMS) was used to evaluate metallic impurity atom concentrations less than 1 ppma, and interstitial gas analysis (IGA) allowed determine carbon, nitrogen and and oxygen concentrations. Three wafers were chosen in each region and were investigated as cut, after phosphorus diffusion at 850 °C for 30 min (similar to the standard diffusion process used to make solar cells) or after an intentional gettering treatment due to a long phosphorus diffusion at 900 °C for 2 h. Mean values of electron bulk lifetime (τ) were determined in as cut (τ 0 ), phosphorus diffused (τ dif ) and gettered (τ get ) wafers, by means of the quasi steady state photoconductance technique 5 at low injection level (~ 10 12 cm -3 ), and also by the contact less microwave phase shift (µWPS) technique 6 . These measurements could be applied before and after any type of treatment, including dissociation of FeB and CrB pairs, by annealing at 200°C or by strong illumination.…”
Section: Methodsmentioning
confidence: 99%