2012
DOI: 10.1007/s11664-012-2274-4
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Conductive Anodic Filament Failures in Fine-Pitch Through-Via Interconnections in Organic Package Substrates

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Cited by 7 publications
(3 citation statements)
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“…Moisture absorption of the epoxy-glass fiber composite material was characterized using gravimetric measurements after exposure to different values of RH at 60°C for a duration of 4 h in a humidity chamber. The procedure for gravimetric measurement has been previously described [2]. The results of gravimetric measurement at different RH values are summarized in Table 1.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Moisture absorption of the epoxy-glass fiber composite material was characterized using gravimetric measurements after exposure to different values of RH at 60°C for a duration of 4 h in a humidity chamber. The procedure for gravimetric measurement has been previously described [2]. The results of gravimetric measurement at different RH values are summarized in Table 1.…”
Section: Methodsmentioning
confidence: 99%
“…Electrical interconnections on FR4 boards are typically established using through-holes that are drilled and plated with copper to interconnect components on either side of the board. Copper plated-through-holes (PTHs), however, under DC voltage bias in the presence of humidity and temperature pose reliability concerns [1][2][3][4]. Catastrophic failures (i.e., electrical insulation failures) due to electrochemical migration between PTHs in FR4s in the presence of humidity and DC bias have been reported by several researchers [5][6][7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…Unmasked regions of the copper foil are removed during the etching process. The trend towards performance improvement by miniaturization and consequently the decrease in the distance between the conduction paths affects not only the in-service behavior [9][10][11] but also the production of PCBs [12]. In spray etching, the narrow spacing between masked regions and the comparatively high layer thicknesses of the mask constitute a surface structure with cavities, wherein the etching reaction takes place.…”
Section: Introductionmentioning
confidence: 99%