Compositional and structural properties of hydrogenated amorphous silicon-carbon films prepared by ultra-high-vacuum plasma-enhanced chemical vapour deposition with different carbon sources
Abstract:Hydrogenated amorphous siliconxarbon films were deposited by ultra-highvacuum plasma-enhanced chemical vapour deposition in silane + methane and silane + acetylene gas mixtures. Both types of film were compared with respect to their compositional, optical and structural properties. They have an optical gap in the range 2.3-3.3eV for [C]/[C + Si] between 0.2 and 0.1 and possess high uniformity. The deposition rate of CzHz-based films is 4-5As-', one order of magnitude higher than CH4-based films having large ba… Show more
“…͑5͒. N is computed by using the sp 2 fraction, obtained from IR spectroscopy 19 and the film atomic density given by nuclear measurements, 20 for the samples of the present work. N values for literature samples 17 were estimated following Ref.…”
“…͑5͒. N is computed by using the sp 2 fraction, obtained from IR spectroscopy 19 and the film atomic density given by nuclear measurements, 20 for the samples of the present work. N values for literature samples 17 were estimated following Ref.…”
“…In this work, Au-SiC interface has been modified by a thin layer of metal sulfide, MS (PbS specifically). Synthesis of luminescent nanocrystalline MS (M = Pb, Cd) thin films were done in order to introduce them as interfacial layer [5]. Lead sulfide (PbS) is an important member of the chalcogenides which offers large tenability.…”
“…The deposition parameters were optimized to obtain device-quality films (Demichelis, Giorgis, Pirri and Tresso 1995b). The fihn thicknesses were in the range of 0.5-1.2 pm.…”
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