Comparison of pulsed dc and rf hollow cathode depositions of Cr and CrN films

Baránková, Hana; Bárdoš, Ladislav

doi:10.1016/j.surfcoat.2011.03.013

Cited by 12 publications

(2 citation statements)

References 14 publications

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“…In the case of the Cr/CrN bilayers, the incoherent-type interlayer generates a deformation around the zone where the crystalline structure changes, as shown in Figure 3. Such incoherence produces tensions in the atoms around the interlayer [45]. This behavior causes the force exerted by the indenter to be rapidly dissipated by the material in different directions to the load application, as shown in Figure 4.…”

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confidence: 99%

Molecular dynamics simulation of the nanoindentation process in Cr/CrN and (Cr/CrN)2 thin films

Amaya-Roncancio¹,

Arias-Mateus²,

Giraldo³

2018

ces

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Molecular dynamics (MD) simulations were carries out for studying the influence of nanoindentation in the atomistic deformation mechanisms of Cr/CrN and (Cr/CrN)2 coatings with BCC and FCC crystalline structures for Cr and CrN, respectively. The Morse potential was employed in order to determine the atomic interaction forces of the Cr-Cr and Cr-N atoms. A non-deformable potential solid sphere was implemented for determining the role of the nanoindenter. The Oliver-Parr method (OP) was used to obtain the hardness and elastic modulus of the Cr/CrN and (Cr/CrN)2 layers, resulting in values of 18 and 20 GPa for Cr/CrN and (Cr/CrN)2, respectively. The Cheng method was used for correcting the hardness values obtained by the OP method. The Cheng correction showed higher hardness values since it avoids the influence of the scale effect. Regarding the elasticity modulus, Cr/CrN and (Cr/CrN)2 exhibited values of 217.86 GPa and 258.9 GPa, respectively. Simulations of the temperature influence on the hardness were carried out over a range of 300-1000 K. Results indicate that the hardness decreased as a function of the temperature. 4618 S. Amaya-Roncancio et al.

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confidence: 99%

Molecular dynamics simulation of the nanoindentation process in Cr/CrN and (Cr/CrN)2 thin films

Amaya-Roncancio¹,

Arias-Mateus²,

Giraldo³

2018

ces

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“…Similarly, if pulsed DC, P-DC, is used, then only energies and diameters that result in times shorter than the duration of the negative pulse are allowable. Table 3 [139,[191][192][193]. The cathode diameter limitation for P-DC is much less and if pulse lengths longer than 200 ns are used, the discharge appears to be very similar to a DC discharge [122,194].…”

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confidence: 99%