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2015
DOI: 10.1016/j.tsf.2015.02.066
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The use of hollow cathodes in deposition processes: A critical review

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Cited by 123 publications
(59 citation statements)
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References 284 publications
(300 reference statements)
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“…and plasma source (ICP, ECR, Magnetron, HWS, etc.) in addition to geometrical effects provided by electrodes when setting up the plasma reactor [6]. In this context, the capacitively coupled radiofrequency (CCRF) discharge with parallel plate electrodes has been largely used for plasma processing applications [7][8][9].…”
Section: Introductionmentioning
confidence: 99%
“…and plasma source (ICP, ECR, Magnetron, HWS, etc.) in addition to geometrical effects provided by electrodes when setting up the plasma reactor [6]. In this context, the capacitively coupled radiofrequency (CCRF) discharge with parallel plate electrodes has been largely used for plasma processing applications [7][8][9].…”
Section: Introductionmentioning
confidence: 99%
“…To begin, we recognize the high‐energy e‐beams used to generate the plasma in this work were extracted from a hollow cathode discharge. In these discharges, the discharge current depends on the cathode geometry, applied voltage, and gas pressure . Despite the differences in geometry of the cathodes studied here, Figure shows a similar increase in discharge current with increasing pressure in both systems.…”
Section: Resultsmentioning
confidence: 67%
“…This is known as the hollow cathode effect and gives a high cathode current with corresponding increase in plasma density. [13], [14] Another important feature of the hollow cathode design is the fact that the gas is trapped and cannot become rarefied as in an open magnetron, which makes it possible to achieve a super-saturated metal vapor in the hollow cathode. [15] This high density of sputtered material is especially important for the growth of nanoparticles, as will be explained in the section on nanoparticle growth.…”
Section: Hollow Cathode Sputteringmentioning
confidence: 99%