Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique

Ehiasarian, Arutiun P.; Hovsepian, P.Eh.; Hultman, Lars; Helmersson, Ulf

doi:10.1016/j.tsf.2003.11.113

Cited by 208 publications

(126 citation statements)

References 23 publications

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“…[13] Ehiasarian et al observed that pretreatment using HiPIMS has improved the adhesion and mechanical properties of CrN thin films. [20] Similarly, Reinhard et al observed improvement in corrosion resistance properties of HiPIMS treated CrN/NbN superlattice structure. [11] Recently, Zhao et al observed that the optical transmittance of Zirconia thin films deposited using HiPIMS is more as compared to dc-MS. [17] Looking at the vast capabilities of HiPIMS technique in depositing various kinds of thin films, it is surprising to note that HiPIMS processes have not yet been applied for the deposition of magnetic thin films with recent excep- * mgupta@csr.res.in/dr.mukul.gupta@gmail.com tion of Fe 2 O 3 [18,19] and FeCuNbSiB.…”

Section: Introductionmentioning

confidence: 88%

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Tayal

Gupta

et al. 2015

Surface and Coatings Technology

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In this work, we studied phase formation, structural and magnetic properties of iron-nitride (Fe-N) thin films deposited using high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (dc-MS). The nitrogen partial pressure during deposition was systematically varied both in HiPIMS and dc-MS. Resulting Fe-N films were characterized for their microstructure, magnetic properties and nitrogen concentration. We found that HiPIMS deposited Fe-N films show a globular nanocrystalline microstructure and improved soft magnetic properties. In addition, it was found that the nitrogen reactivity impedes in HiPIMS as compared to dc-MS. Obtained results can be understood in terms of distinct plasma properties of HiPIMS.

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Section: Introductionmentioning

confidence: 88%

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Tayal

Gupta

et al. 2015

Surface and Coatings Technology

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“…10(b). Upon increasing the flux of ions available at the substrate (achieved, e.g., by increasing the peak target current), repeated nucleation occurs 31,124 resulting in suppression of the columnar structure and transition from a dense polycrystalline to a globular nanocrystalline microstructure, 31 as shown in Figs. 10(c)-10(d).…”

Section: B Phase Composition Tailoring By Hipimsmentioning

confidence: 99%

“…It is, therefore, evident that the low-energy highflux ion irradiation during HiPIMS can be used to overcome the characteristically underdense and rough microstructures and obtain morphologies unique for low-temperature sputter deposition. 31 This, in turn, allows growth of films with higher hardness, 13,101,124 lower friction coefficient, 13,125 and improved scratch and wear as well as corrosion resistance, 13,124 as compared to films deposited by DCMS.…”

Section: B Phase Composition Tailoring By Hipimsmentioning

confidence: 99%

An introduction to thin film processing using high-power impulse magnetron sputtering

2012

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High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical vapor deposition technique and is already making its way to industrial applications. The major difference between HiPIMS and conventional magnetron sputtering processes is the mode of operation. In HiPIMS the power is applied to the magnetron (target) in unipolar pulses at a low duty factor (andlt;10%) and low frequency (andlt;10 kHz) leading to peak target power densities of the order of several kilowatts per square centimeter while keeping the average target power density low enough to avoid magnetron overheating and target melting. These conditions result in the generation of a highly dense plasma discharge, where a large fraction of the sputtered material is ionized and thereby providing new and added means for the synthesis of tailor-made thin films. In this review, the features distinguishing HiPIMS from other deposition methods will be addressed in detail along with how they influence the deposition conditions, such as the plasma parameters and the sputtered material, as well as the resulting thin film properties, such as microstructure, phase formation, and chemical composition. General trends will be established in conjunction to industrially relevant material systems to present this emerging technology to the interested reader.Funding Agencies|Swedish Research Council (VR)|623-2009-7348

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“…The high plasma densities, in turn, have as a consequence high degrees of ionization of both gas and sputtered species (peak values up to 90% for Ti [21]) and peak substrate ion current densities up to three orders of magnitude higher than those obtained in dcMS processes [17]. These plasma conditions have been shown to enable deposition of ultra-smooth and dense films [22,23], allow for control over the film microstructure [24,25] and phase composition [26][27][28], and lead to films with superior mechanical [29] optical [28], and electrical properties [30,31]. As far as it concerns DLC, Bugaev et al [32] and DeKoven et al [33] have reported results on growth of amorphous carbon films by HiPIMS which indicated sp 3 fractions up to 45 % as estimated by Raman spectroscopy measurements.…”

Section: Introductionmentioning

confidence: 99%

Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Sarakinos

Braun

Zilkens

et al. 2012

Surface and Coatings Technology

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Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at pulsing frequencies of 250 Hz and 1 kHz. Films are also deposited by direct current magnetron sputtering (dcMS), for reference. In both HiPIMS and dcMS cases, unipolar pulsed negative bias voltages up to 150 V are applied to the substrate to tune the energy of the positively charged ions that bombard the growing film. Plasma analysis reveals that HiPIMS leads to generation of a larger number of ions with larger average energies, as compared 2 to dcMS. At the same time, the plasma composition is not affected, with Ar + ions being the dominant ionized species at all deposition conditions. Analysis of the film properties shows that HiPIMS allows for growth of amorphous carbon films with sp 3 bond fraction up to 45% and density up to 2.2 gcm -3 . The corresponding values achieved by dcMS are 30% and 2.05 gcm -3 , respectively. The larger fraction of sp 3 bonds and mass density found in films grown by HiPIMS are explained in light of the more intense ion irradiation provided by the HiPIMS discharge as compared to the dcMS one.

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Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique

Cited by 208 publications

References 23 publications

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

An introduction to thin film processing using high-power impulse magnetron sputtering

Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

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